SCHEMBL8907759

SCHEMBL8907759

C=COCOCC(COCOC=C)(COCOC=C)COCC(COCOC=C)(COCOC=C)COCOC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14483853 0.85
SCHEMBL13708124 0.83
SCHEMBL12304887 0.83 THRB (0.43)
SCHEMBL13113332 0.83 ALDH1A1 (0.42)
SCHEMBL12017042 0.81 ALDH1A1 (0.55)
SCHEMBL16312860 0.80
SCHEMBL15715867 0.80
SCHEMBL12304886 0.78 ALDH1A1 (0.56)
SCHEMBL13128994 0.77 THRB (0.37)
SCHEMBL253792 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017524-B2 Vacuum film formation method for inorganic layer, barrier laminate, device, and optical component FUJIFILM CORPORATION (JP) 2015-04-28 US disclosed
US-8187718-B2 Barrier laminate, barrier film substrate and device FUJIFILM CORPORATION (JP) 2012-05-29 US disclosed
US-20090258235-A1 BARRIER LAMINATE, BARRIER FILM SUBSTRATE AND DEVICE FUJIFILM CORPORATION (JP) 2009-10-15 US disclosed
US-20090233108-A1 VACUUM FILM FORMATION METHOD FOR INORGANIC LAYER, BARRIER LAMINATE, DEVICE, AND OPTICAL COMPONENT FUJIFILM CORPORATION (JP) 2009-09-17 US disclosed