SCHEMBL8909472

SCHEMBL8909472

CN(C)c1cccc2oc(=O)c(C(=O)c3ccccc3)cc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 8/20 0.50
ALDH1A1 P00352 6/20 0.50
MAOA P21397 3/20 0.50
HPGD P15428 2/20 0.50
MIF P14174 1/20 0.50
KDM4E B2RXH2 4/20 0.49
RAB9A P51151 3/20 0.49
POLB P06746 2/20 0.49
NPC1 O15118 2/20 0.49
SMN1; SMN2 Q16637 3/20 0.46
PPARG P37231 2/20 0.46
PPARA Q07869 1/20 0.45
LMNA P02545 3/20 0.43
GAA P10253 2/20 0.43
MAPT P10636 2/20 0.43
GLA P06280 1/20 0.43
NFKB1 P19838 1/20 0.43
HTT P42858 1/20 0.43
NFKB2 Q00653 1/20 0.43
RELA Q04206 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19870464 0.81 MAOB (0.63) MAOBALDH1A1MAOAHPGDMIF
SCHEMBL29286791 0.80 KDM4E (0.58) MAOBALDH1A1MAOAHPGDKDM4E
SCHEMBL13701010 0.74 GAA (0.44) ALDH1A1MAOAHPGDKDM4ESMN1; SMN2
SCHEMBL51507 0.74 MAOB (0.73) MAOBALDH1A1MAOAHPGDMIF
SCHEMBL1711024 0.74 ALDH1A1 (0.76) MAOBALDH1A1MAOAHPGDMIF
SCHEMBL51506 0.74 MAOB (0.76) MAOBALDH1A1MAOAHPGDMIF
SCHEMBL5996884 0.72 MAOB (0.66) MAOBALDH1A1MAOAHPGDMIF
SCHEMBL4953673 0.72 GAA (0.57) ALDH1A1HPGDKDM4ERAB9ANPC1
SCHEMBL11097437 0.72 MAOB (0.60) MAOBALDH1A1MAOAHPGDMIF
SCHEMBL501813 0.71 MAPT (0.77) ALDH1A1HPGDKDM4ERAB9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5645973-A Process for adjusting the sensitivity to radiation of photopolymerizable compositions CIBA-GEIGY CORPORATION (US) 1997-07-08 US disclosed
US-5573889-A Process for adjusting the sensitivity to radiation of photopolymerizable compositions CIBA-GEIGY CORPORATION (US) 1996-11-12 US disclosed
EP-0425440-B1 Method of adjusting the photosensitivity of photopolymerizable compositions CIBA GEIGY AG (CH) 1994-11-17 EP disclosed
EP-0425440-A1 Method of adjusting the photosensitivity of photopolymerizable compositions CIBA-GEIGY AG (CH) 1991-05-02 EP disclosed