⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14219874 | 0.89 | LMNA (0.33) | — | |
| SCHEMBL14220073 | 0.80 | LMNA (0.31) | — | |
| SCHEMBL22882724 | 0.75 | LMNA (0.37) | — | |
| SCHEMBL14479515 | 0.75 | LMNA (0.35) | — | |
| SCHEMBL13985755 | 0.75 | FFAR1 (0.31) | — | |
| SCHEMBL19277117 | 0.74 | LMNA (0.35) | — | |
| SCHEMBL3852488 | 0.72 | LMNA (0.52) | — | |
| SCHEMBL2631349 | 0.72 | LMNA (0.39) | — | |
| SCHEMBL18746070 | 0.72 | LMNA (0.39) | — | |
| SCHEMBL9876118 | 0.72 | LMNA (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8187789-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20090269700-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-1906248-A1 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |