Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 6/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | LMNA | P02545 | 4/20 | 0.54 |
| ▸ | TP53 | P04637 | 3/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.54 |
| ▸ | CA12 | O43570 | 3/20 | 0.54 |
| ▸ | CA1 | P00915 | 3/20 | 0.54 |
| ▸ | CA2 | P00918 | 3/20 | 0.54 |
| ▸ | CA3 | P07451 | 3/20 | 0.54 |
| ▸ | CA4 | P22748 | 3/20 | 0.54 |
| ▸ | CA6 | P23280 | 3/20 | 0.54 |
| ▸ | CA5A | P35218 | 3/20 | 0.54 |
| ▸ | CA7 | P43166 | 3/20 | 0.54 |
| ▸ | CA9 | Q16790 | 3/20 | 0.54 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.54 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL555296 | 1.00 | APP (0.59) | APPKDM4EALDH1A1LMNATP53 | |
| SCHEMBL1397053 | 1.00 | APP (0.59) | APPKDM4EALDH1A1LMNATP53 | |
| Hydrochloric Acid SCHEMBL10484291 | 0.97 | APP (0.56) | APPKDM4EALDH1A1LMNATP53 | |
| SCHEMBL18199531 | 0.93 | PTGES (0.53) | APPKDM4EALDH1A1LMNATP53 | |
| Phenol SCHEMBL3488360 | 0.91 | APP (0.50) | APPKDM4EALDH1A1LMNATP53 | |
| 4-Vinylphenol SCHEMBL17478290 | 0.89 | APP (0.48) | APPKDM4EALDH1A1LMNATP53 | |
| SCHEMBL2045167 | 0.87 | APP (0.46) | APPKDM4EALDH1A1LMNATP53 | |
| SCHEMBL2045166 | 0.87 | APP (0.46) | APPKDM4EALDH1A1LMNATP53 | |
| SCHEMBL10270315 | 0.87 | MEN1 (0.50) | APPKDM4EALDH1A1LMNATP53 | |
| SCHEMBL9461723 | 0.85 | CYP3A4 (0.65) | APPKDM4EALDH1A1LMNATP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1098 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115888680-B | Catalyst for synthesizing aromatic ether by reaction of phenolic compound and dimethyl carbonate and preparation method thereof | 常州大学 | 2025-05-30 | — | — | CN | claimed |
| US-20250009655-A1 | BIPHASIC COMPOSITIONS COMPRISING ONE OR BOTH OF CARBONATE AND PHOSPHATE | Natural Extraction Systems, LLC | 2025-01-09 | — | — | US | claimed |
| WO-2025000994-A1 | SECONDARY BATTERY AND ELECTRIC DEVICE | 欣旺达动力科技股份有限公司 | 2025-01-02 | — | — | WO | claimed |
| CN-118773098-A | Recombinant escherichia coli for synthesizing trans-anethole from head and construction method and application thereof | 郑州大学 | 2024-10-15 | — | — | CN | claimed |
| US-20240315965-A1 | COMPOSITIONS AND METHODS RELATED TO PHARMACEUTICAL EXCIPIENTS | Natural Extraction Systems, LLC (US) | 2024-09-26 | — | — | US | claimed |
| CN-114950547-B | Preparation method of phenol sodium salt modified hydrotalcite and application of phenol sodium salt modified hydrotalcite in preparation of phenol ether flavor | 常州大学 | 2024-04-02 | — | — | CN | claimed |
| CN-113439098-B | Recyclable and reworkable epoxy resins | 阿迪塔亚博拉化学品（泰国）有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-117736442-A | Electrician epoxy resin active additive, composition, preparation method and application thereof | 中国科学院宁波材料技术与工程研究所 | 2024-03-22 | — | — | CN | claimed |
| EP-3921356-B1 | RECYCLABLE AND REWORKABLE EPOXY RESINS | ADITYA BIRLA CHEMICALS THAILAND LTD EPOXY DIV (TH) | 2023-12-27 | — | — | EP | claimed |
| CN-117142928-A | Method for performing Diels-Alder reaction on photocatalytic dienophile and dienophile | 陕西师范大学 | 2023-12-01 | — | — | CN | claimed |
| US-4963463-A | Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-10-16 | — | — | US | claimed |
| EP-0390570-A1 | Resist | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-10-03 | — | — | EP | claimed |
| EP-0385457-A2 | High surface hardness transparent resin and polymerizable monomer | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-09-05 | — | — | EP | claimed |
| US-4923928-A | High impact strength, adhesives, prepregs, composites | BASF AKTIENGESELLSCHAFT (DE) | 1990-05-08 | — | — | US | claimed |
| EP-0330406-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-08-30 | — | — | EP | claimed |
| US-4468508-A | Glycidyl ether of novolak type substituted phenolic resin, process for producing the same, and encapsulating compound composed mainly of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1984-08-28 | — | — | US | claimed |
| EP-0014816-B1 | POLYCYCLIC POLYPHENOLS WITH PROPENYL GROUPS AND CURABLE MIXTURES BASED ON MALEIMIDES AND PROPENYL-SUBSTITUTED PHENOLS | CIBA-GEIGY AG (CH) | 1983-08-24 | — | — | EP | claimed |
| US-4228266-A | FROM CYCLOPENTADIENE, DICYCLOPENTADIENE, ALKYL-SUBSTITUTED COMPOUNDS THEREOF AND A HYDROXYSTYRENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-10-14 | — | — | US | claimed |
| US-4147830-A | Recording sheet | FUJI PHOTO FILM CO., LTD. (JP) | 1979-04-03 | — | — | US | claimed |
| US-4129557-A | CYCLOPENTADIENE, DICYCLOPENTADIENE, HYDROXYSTYRENE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1978-12-12 | — | — | US | claimed |