Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 5/20 | 0.42 |
| ▸ | GRIN3B | O60391 | 5/20 | 0.42 |
| ▸ | GRIN1 | Q05586 | 5/20 | 0.42 |
| ▸ | GRIN2A | Q12879 | 5/20 | 0.42 |
| ▸ | GRIN2B | Q13224 | 5/20 | 0.42 |
| ▸ | GRIN2C | Q14957 | 5/20 | 0.42 |
| ▸ | GRIN3A | Q8TCU5 | 5/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4304613 | 0.82 | GRIN2D (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL892133 | 0.79 | — | — | |
| SCHEMBL4301887 | 0.79 | EPHX2 (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3656833 | 0.75 | GRIN2D (0.46) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL7731543 | 0.74 | GRIN2D (0.48) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL891928 | 0.71 | — | — | |
| SCHEMBL8053022 | 0.71 | GRIN2D (0.42) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL451246 | 0.71 | GRIN2D (0.56) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL451248 | 0.71 | GRIN2D (0.56) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL9537877 | 0.70 | GRIN2D (0.46) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9312127-B2 | Method for producing semiconductor apparatus substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20160064220-A1 | METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9261783-B2 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8722307-B2 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-13 | — | — | US | disclosed |
| US-8697903-B2 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20140051024-A1 | FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER, AND DIFLUOROHYDROXYCARBOXYLIC ACID | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-20 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8431323-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20080248422-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20070218402-A1 | Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-20 | — | — | US | disclosed |
| EP-1616854-B1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| EP-1741705-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-20060093960-A1 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-05-04 | — | — | US | disclosed |
| EP-1652844-A2 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-05-03 | — | — | EP | disclosed |
| EP-1616854-A1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-18 | — | — | EP | disclosed |
| US-20060009602-A1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-01-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060009602-A1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | HRH3, SUV39H2, SUV39H1 | GRIN2D 2298/4885GRIN3B 2914/4885GRIN1 2456/4885 |
| US-20080248422-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | RER1, ACAD9, RRS1 | GRIN2D 371/4885GRIN3B 243/4885GRIN1 16/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.