Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8752313 | 1.00 | HCAR2 (0.40) | HCAR2KEAP1NFE2L2MAPTPKM | |
| SCHEMBL6692495 | 0.77 | ALDH1A1 (0.41) | HCAR2KEAP1NFE2L2TSHR | |
| SCHEMBL11959876 | 0.77 | ALDH1A1 (0.41) | HCAR2KEAP1NFE2L2TSHR | |
| SCHEMBL6692490 | 0.77 | ALDH1A1 (0.41) | HCAR2KEAP1NFE2L2TSHR | |
| SCHEMBL10821030 | 0.77 | NPSR1 (0.48) | HCAR2MAPTPKML3MBTL1TSHR | |
| SCHEMBL8921055 | 0.73 | MAPT (0.38) | MAPTPKMTSHR | |
| SCHEMBL8921049 | 0.73 | MAPT (0.38) | MAPTPKMTSHR | |
| SCHEMBL11562125 | 0.72 | — | — | |
| SCHEMBL14776189 | 0.72 | MAPT (0.40) | MAPTPKMTSHR | |
| SCHEMBL14776192 | 0.72 | MAPT (0.40) | MAPTPKMTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5614351-A | Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation | HOECHST AKTIENGESELLSCHAFT (DE) | 1997-03-25 | — | — | US | disclosed |
| US-5217843-A | Containing acid cleavable compound and compound that forms acid when subjected to high energy radiation | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-06-08 | — | — | US | disclosed |