Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | DGKA | P23743 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | PAM | P19021 | 2/20 | 0.31 |
| ▸ | FAAH | O00519 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2759402 | 0.89 | DGKA (0.43) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL14228085 | 0.88 | ALDH1A1 (0.34) | ALDH1A1LMNAL3MBTL1POLBGAA | |
| SCHEMBL3430825 | 0.88 | DGKA (0.50) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL18785733 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL11917862 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL18785847 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL18785848 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL18785736 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL18785845 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH | |
| SCHEMBL18785732 | 0.86 | DGKA (0.53) | ALDH1A1DGKALMNAPAMFAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11839476-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-12 | — | — | US | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9321875-B2 | Additive for resist and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2016-04-26 | — | — | US | disclosed |
| US-9063411-B2 | Additive for resist and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2015-06-23 | — | — | US | disclosed |
| US-8980526-B2 | Hydrophilic photoacid generator and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2015-03-17 | — | — | US | disclosed |
| US-8951710-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-8951710-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-20140342274-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-20140342274-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8835096-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8835096-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20130177852-A1 | HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-07-11 | — | — | US | disclosed |
| US-20130171560-A1 | ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-07-04 | — | — | US | disclosed |
| US-20130171561-A1 | ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-07-04 | — | — | US | disclosed |
| US-20120219887-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-30 | — | — | US | disclosed |
| US-8187790-B2 | Polymer for resist and resist composition manufactured using the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-05-29 | — | — | US | disclosed |
| US-20110244392-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20100081079-A1 | POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. | 2010-04-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | CASR, LIFR, LBR | ALDH1A1 4520/4885DGKA 253/4885LMNA 482/4885 |
| US-11839476-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | AFF1, AFF4, AFF2 | ALDH1A1 256/4885DGKA 3699/4885LMNA 2676/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.