⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11917858 | 0.78 | — | — | |
| SCHEMBL8927973 | 0.78 | CA1 (0.32) | — | |
| SCHEMBL15083764 | 0.71 | ALDH1A1 (0.37) | — | |
| SCHEMBL22437516 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL4457159 | 0.69 | PTGS1 (0.35) | — | |
| SCHEMBL24384228 | 0.68 | CA1 (0.45) | — | |
| SCHEMBL14527647 | 0.68 | CA1 (0.31) | — | |
| SCHEMBL8927969 | 0.68 | CA1 (0.31) | — | |
| SCHEMBL4401187 | 0.68 | ALDH1A1 (0.35) | — | |
| SCHEMBL12994724 | 0.67 | ALDH1A1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9321875-B2 | Additive for resist and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2016-04-26 | — | — | US | disclosed |
| US-9063411-B2 | Additive for resist and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2015-06-23 | — | — | US | disclosed |
| US-8980526-B2 | Hydrophilic photoacid generator and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2015-03-17 | — | — | US | disclosed |
| US-20130177852-A1 | HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-07-11 | — | — | US | disclosed |
| US-20130171561-A1 | ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-07-04 | — | — | US | disclosed |
| US-20130171560-A1 | ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-07-04 | — | — | US | disclosed |
| US-20130164674-A1 | NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2013-06-27 | — | — | US | disclosed |
| US-8187790-B2 | Polymer for resist and resist composition manufactured using the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-05-29 | — | — | US | disclosed |
| US-20100081079-A1 | POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. | 2010-04-01 | — | — | US | disclosed |