SCHEMBL8927969

SCHEMBL8927969

O=S(=O)(O)C(F)(F)COS(=O)(=O)C(Cl)(Cl)Cl

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22437516 0.83 ALDH1A1 (0.36) CA1CA2CA9
SCHEMBL14527647 0.79 CA1 (0.31) CA1CA2CA9
SCHEMBL55106 0.78 CA1 (0.52) CA1CA2CA9
SCHEMBL11917853 0.78 CA1 (0.30) CA1CA2CA9
SCHEMBL15083764 0.74 ALDH1A1 (0.37) CA1CA2CA9
SCHEMBL7899371 0.74 CA1 (0.33) CA1CA2CA9
SCHEMBL8927973 0.72 CA1 (0.32) CA1CA2CA9
SCHEMBL4401187 0.70 ALDH1A1 (0.35) CA1CA2CA9
SCHEMBL8927974 0.69 CA1 (0.30) CA1CA2CA9
SCHEMBL6366627 0.69 F2 (0.34) CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9321875-B2 Additive for resist and resist composition comprising same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2016-04-26 US disclosed
US-9063411-B2 Additive for resist and resist composition comprising same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2015-06-23 US disclosed
US-8980526-B2 Hydrophilic photoacid generator and resist composition comprising same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2015-03-17 US disclosed
US-20130177852-A1 HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-07-11 US disclosed
US-20130171561-A1 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-07-04 US disclosed
US-20130171560-A1 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-07-04 US disclosed
US-20130164674-A1 NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-06-27 US disclosed
US-8187790-B2 Polymer for resist and resist composition manufactured using the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-05-29 US disclosed
US-20100081079-A1 POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-04-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130164674-A1 NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME SMC1A, SMCHD1, SMC2 CA1 3219/4885CA2 4470/4885CA9 3706/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.