Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS3 | P29474 | 2/20 | 0.60 |
| ▸ | NOS2 | P35228 | 2/20 | 0.60 |
| ▸ | NOS1 | P29475 | 1/20 | 0.60 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.43 |
| ▸ | UHRF1 | Q96T88 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | LCK | P06239 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | APAF1 | O14727 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | HK1 | P19367 | 1/20 | 0.35 |
| ▸ | CASP1 | P29466 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7489 | 0.96 | — | — | |
| SCHEMBL1050198 | 0.96 | NOS3 (0.63) | NOS3NOS2NOS1POLBAPOBEC3G | |
| SCHEMBL9472907 | 0.96 | NOS3 (0.63) | NOS3NOS2NOS1POLBAPOBEC3G | |
| Bromide SCHEMBL10623440 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G | |
| Hydrochloric Acid SCHEMBL458427 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G | |
| Iodide SCHEMBL20816339 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G | |
| SCHEMBL19816355 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G | |
| SCHEMBL487353 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G | |
| Hydrogen Sulfide SCHEMBL5051773 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G | |
| SCHEMBL28385227 | 0.93 | NOS3 (0.60) | NOS3NOS2NOS1POLBAPOBEC3G |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8889563-B2 | Method and apparatus for etching the silicon oxide layer of a semiconductor substrate | PUKYONG NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION (KR) | 2014-11-18 | — | — | US | claimed |
| US-20120196445-A1 | METHOD AND APPARATUS FOR ETCHING THE SILICON OXIDE LAYER OF A SEMICONDUCTOR SUBSTRATE | PUKYONG NATIONAL UNIVERSITY (KR) | 2012-08-02 | — | — | US | claimed |
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | claimed |
| US-20110117752-A1 | METHOD AND SYSTEM FOR ETCHING A SILICON DIOXIDE FILM USING DENSIFIED CARBON DIOXIDE | PUKYONG NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION (KR) | 2011-05-19 | — | — | US | claimed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | claimed |
| CN-118704017-A | Method for electrochemical synthesis of lithium hexafluorophosphate | 无锡绿能电合科技有限公司 | 2024-09-27 | — | — | CN | disclosed |
| US-8889563-B2 | Method and apparatus for etching the silicon oxide layer of a semiconductor substrate | PUKYONG NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION (KR) | 2014-11-18 | — | — | US | disclosed |
| US-8790470-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-29 | — | — | US | disclosed |
| US-8585917-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-19 | — | — | US | disclosed |
| US-20120196445-A1 | METHOD AND APPARATUS FOR ETCHING THE SILICON OXIDE LAYER OF A SEMICONDUCTOR SUBSTRATE | PUKYONG NATIONAL UNIVERSITY (KR) | 2012-08-02 | — | — | US | disclosed |
| US-20120085495-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-12 | — | — | US | disclosed |
| US-20120080059-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-05 | — | — | US | disclosed |
| US-20030171609-A1 | Aminonitrile production | INVISTA NORTH AMERICA S.A.R.L. | 2003-09-11 | — | — | US | disclosed |
| US-6569802-B1 | Catalyst for selective hydrogenation of dinitriles | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-05-27 | — | — | US | disclosed |
| US-20030032192-A1 | Synthesis of nanoparticles | CENTRUM FUR ANGEWANDTE NANOTECHNOLOGIE (CAN) GMBH (DE) | 2003-02-13 | — | — | US | disclosed |
| CN-1388827-A | Synthesis of nanoparticles | NANOSOLUTIONS GMBH (DE) | 2003-01-01 | — | — | CN | disclosed |
| CN-1359369-A | Process for producing aminonitriles | DU PONT (US) | 2002-07-17 | — | — | CN | disclosed |
| EP-1189876-A2 | PROCESS FOR HYDROGENATING DINITRILES IN AMINONITRILES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-03-27 | — | — | EP | disclosed |
| WO-2000064862-A2 | PROCESS FOR HYDROGENATING DINITRILES IN AMINONITRILES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-11-02 | — | — | WO | disclosed |
| WO-2000007974-A1 | 2-FLUORO MUTILIN DERIVATIVES | SMITHKLINE BEECHAM P.L.C. (GB) | 2000-02-17 | — | — | WO | disclosed |