SCHEMBL894324

SCHEMBL894324

O=C=Nc1cccc(-c2cccc(N=C=O)c2)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.48
MAPK1 P28482 1/20 0.48
CYP3A4 P08684 5/20 0.45
TRPA1 O75762 1/20 0.45
TSHR P16473 1/20 0.41
GABRA1 P14867 1/20 0.39
GABRB2 P47870 1/20 0.39
ALDH1A1 P00352 1/20 0.38
HPGD P15428 1/20 0.38
CYP1A2 P05177 1/20 0.34
MIF P14174 1/20 0.31
CYP2C9 P11712 1/20 0.31
HSD17B1 P14061 1/20 0.31
HSD17B2 P37059 1/20 0.31
MEN1 O00255 1/20 0.31
ESR1 P03372 1/20 0.31
KMT2A Q03164 1/20 0.31
KMO O15229 1/20 0.30
CA12 O43570 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30365208 1.00 TDP1 (0.48) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL1899306 0.94 MAPK1 (0.44) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL894657 0.92 TDP1 (0.47) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL10615043 0.87 TDP1 (0.54) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL27873 0.87 TDP1 (0.54) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL29849714 0.87 AGXT (0.40) TDP1MAPK1CYP3A4TRPA1ALDH1A1
SCHEMBL29849778 0.87 TDP1 (0.39) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL29849567 0.87 AGXT (0.40) TDP1MAPK1CYP3A4TRPA1ALDH1A1
SCHEMBL27621561 0.85 TDP1 (0.52) TDP1MAPK1CYP3A4TRPA1TSHR
SCHEMBL28522647 0.85 ATM (0.44) TDP1MAPK1CYP3A4TRPA1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 157 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11673991-B2 High stress thermal plastic polyurethane, its preparing formulation and making process CHANDA CHEMICAL CORP. (TW) 2023-06-13 US claimed
EP-4089130-A1 THERMOPLASTIC POLYURETHANE WITH HIGH TENSILE STRENGTH, PREPARATION FORMULATION THEREOF AND MANUFACTURING METHOD THEREFOR Chanda Chemical Corp. (TW) 2022-11-16 EP claimed
US-20220325029-A1 High stress thermal plastic polyurethane, its preparing formulation and making process CHANDA CHEMICAL CORP. (TW) 2022-10-13 US claimed
WO-2021138803-A1 THERMOPLASTIC POLYURETHANE WITH HIGH TENSILE STRENGTH, PREPARATION FORMULATION THEREOF AND MANUFACTURING METHOD THEREFOR 诠达化学股份有限公司 2021-07-15 WO claimed
US-20210179768-A1 High stress thermal plastic polyurethane, its preparing formulation and making process CHANDA CHEMICAL CORP. (TW) 2021-06-17 US claimed
EP-0965029-B1 DETONATING AGENT ELEMENT WITH POLYURETHANE PROTECTING LACQUER DYNAMIT NOBEL AG (DE) 2002-06-26 EP claimed
EP-0965029-A1 DETONATING AGENT ELEMENT WITH POLYURETHANE PROTECTING LACQUER Dynamit Nobel GmbH Explosivstoff- und Systemtechnik (DE) 1999-12-22 EP claimed
WO-1998040692-A1 DETONATING AGENT ELEMENT WITH POLYURETHANE PROTECTING LACQUER DYNAMIT NOBEL GMBH EXPLOSIVSTOFF- UND SYSTEMTECHNIK (DE) 1998-09-17 WO claimed
WO-2025089428-A1 SYNDIOTACTIC POLYSTYRENE LOW TRANSMISSION LOSS CIRCUIT BOARD 東洋紡株式会社 2025-05-01 WO disclosed
US-12261265-B2 Method for producing lithium fluorosulfonate, lithium fluorosulfonate, nonaqueous electrolytic solution, and nonaqueous electrolytic solution secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2025-03-25 US disclosed
EP-3709426-B1 NONAQUEOUS ELECTROLYTE SOLUTION AND ENERGY DEVICE USING SAME MITSUBISHI CHEM CORP (JP) 2025-02-26 EP disclosed
EP-4420875-A1 ADHESIVE COMPOSITION, ADHESIVE SHEET, ELECTROMAGNETIC-WAVE SHIELDING FILM, LAMINATE, AND PRINTED WIRING BOARD TOYOBO MC Corporation (JP) 2024-08-28 EP disclosed
WO-2024111181-A1 THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT ポリプラ・エボニック株式会社 2024-05-30 WO disclosed
US-11988981-B2 Endless belt, transfer device, and image forming apparatus FUJIFILM BUSINESS INNOVATION CORP. (JP) 2024-05-21 US disclosed
US-4377652-A PARTICLES DISPERSED IN A POLYMER BASED ON AN AROMATIC DIAMINE AND TRIMELLITIC ACID OR DERIVATIVE; DIELECTRICS; SUBSTRATES; PRINTED CIRCUITS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1983-03-22 US disclosed
US-4275184-A HYDROSILATION OF POLYDIMETHYL SILOXANE RHONE-POULENC INDUSTRIES (FR) 1981-06-23 US disclosed
US-4213914-A ADDITION-CONDENSATION COPOLYMERS RHONE-POULENC INDUSTRIES (FR) 1980-07-22 US disclosed
US-4147711-A Ethylenic silicon compounds and thermoplastic elastomers obtained therefrom RHONE-POULENC INDUSTRIES (FR) 1979-04-03 US disclosed
US-4088670-A P-(DIMETHYLVINYLSILYL-METHOXY)-BENZOYL CHLORIDE FROM DIMETHYLVINYL-CHLOROMETHYLSILANE AND A P-HYDROXYBENZOIC ACID RHONE-POULENC INDUSTRIES (FR) 1978-05-09 US disclosed
US-4021406-A PHOSPHOROUS COMPOUNDS M & T CHEMICALS INC. (US) 1977-05-03 US disclosed