SCHEMBL8945128

SCHEMBL8945128

CCc1cc(C2CCC(CC)CC2)ccc1Cc1ccc(N)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.35
DHFR P00374 1/20 0.34
ALDH1A1 P00352 2/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
CYP3A4 P08684 1/20 0.33
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
SPHK1 Q9NYA1 1/20 0.33
CCR5 P51681 3/20 0.32
SLC5A2 P31639 4/20 0.32
SLC5A1 P13866 3/20 0.32
PDE4A P27815 2/20 0.31
PDE4B Q07343 2/20 0.31
PDE4C Q08493 2/20 0.31
PDE4D Q08499 2/20 0.31
MEN1 O00255 1/20 0.31
MAPK1 P28482 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8945275 0.90 SPHK1 (0.36) CYP2C9ALDH1A1LMNAMAPTCYP3A4
SCHEMBL8945090 0.90 CYP2C9 (0.47) CYP2C9DHFRALDH1A1LMNAMAPT
SCHEMBL8945230 0.87 ALDH1A1 (0.33) CYP2C9ALDH1A1LMNAMAPTCYP3A4
SCHEMBL8945085 0.86 HTR1D (0.39) DHFRALDH1A1MAPTCYP3A4TSHR
SCHEMBL8944934 0.86 ALDH1A1 (0.33) CYP2C9ALDH1A1LMNAMAPTCYP3A4
SCHEMBL7753027 0.83 CYP3A4 (0.47) CYP2C9ALDH1A1LMNAMAPTCYP3A4
SCHEMBL8945434 0.81 CYP2C9 (0.43) CYP2C9ALDH1A1LMNAMAPTCYP3A4
SCHEMBL8767260 0.78 ALDH1A1 (0.34) CYP2C9DHFRALDH1A1CYP3A4TSHR
SCHEMBL8945103 0.78 SPHK1 (0.37) ALDH1A1CYP3A4TSHRTDP1SPHK1
SCHEMBL7752389 0.78 CYP2C9 (0.46) CYP2C9ALDH1A1LMNAMAPTCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5501884-A Diamino compounds and their production method and liquid crystal alignment layers using the compounds CHISSO CORPORATION (JP) 1996-03-26 US disclosed