SCHEMBL8944934

SCHEMBL8944934

CCC1CCC(c2ccc(Cc3ccc(N)cc3)c(F)c2)CC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
CYP3A4 P08684 1/20 0.33
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
TOP2A P11388 1/20 0.32
TOP2B Q02880 1/20 0.32
SPHK1 Q9NYA1 1/20 0.32
KDM5A P29375 1/20 0.32
KDM4C Q9H3R0 1/20 0.32
KDM5B Q9UGL1 1/20 0.32
CYP2C9 P11712 1/20 0.32
PANK3 Q9H999 1/20 0.31
SLC5A2 P31639 1/20 0.31
RORC P51449 2/20 0.31
HRH3 Q9Y5N1 1/20 0.31
DGKZ Q13574 1/20 0.30
LMNA P02545 1/20 0.30
MAPT P10636 1/20 0.30
MEN1 O00255 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8945310 0.90 CYP2C9 (0.43) ALDH1A1CYP3A4TSHRTDP1TOP2A
SCHEMBL8945336 0.87 ESR2 (0.37) ALDH1A1CYP3A4TSHRTDP1TOP2A
SCHEMBL8945230 0.86 ALDH1A1 (0.33) ALDH1A1CYP3A4TSHRTDP1SPHK1
SCHEMBL8945128 0.86 CYP2C9 (0.35) ALDH1A1CYP3A4TSHRTDP1SPHK1
SCHEMBL8945214 0.84 HTR1D (0.42) ALDH1A1CYP3A4TSHRTDP1SLC5A2
SCHEMBL8945275 0.84 SPHK1 (0.36) ALDH1A1CYP3A4TSHRTDP1SPHK1
SCHEMBL14274431 0.82 SLC6A4 (0.40) ALDH1A1TSHRRORC
SCHEMBL7753027 0.82 CYP3A4 (0.47) ALDH1A1CYP3A4TSHRTDP1SPHK1
SCHEMBL8766803 0.79 ALDH1A1 (0.33) ALDH1A1CYP3A4TSHRTDP1TOP2A
SCHEMBL10409799 0.77 KDM5A (0.36) ALDH1A1CYP3A4KDM5AKDM4CKDM5B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5501884-A Diamino compounds and their production method and liquid crystal alignment layers using the compounds CHISSO CORPORATION (JP) 1996-03-26 US disclosed