SCHEMBL8945135

SCHEMBL8945135

CCC1CCC(c2ccc(Cc3ccc(N)c(C)c3)cc2)CC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SKP2 Q13309 1/20 0.42
SPHK1 Q9NYA1 1/20 0.37
CYP2C9 P11712 3/20 0.36
CYP3A4 P08684 4/20 0.35
SLC5A1 P13866 1/20 0.35
SLC5A2 P31639 1/20 0.35
ALDH1A1 P00352 2/20 0.35
MAPT P10636 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
LMNA P02545 1/20 0.35
MAPK1 P28482 1/20 0.35
ESR1 P03372 7/20 0.33
ESR2 Q92731 7/20 0.33
CYP2D6 P10635 1/20 0.33
S100B P04271 1/20 0.33
KDM4E B2RXH2 1/20 0.33
POLB P06746 1/20 0.33
GAA P10253 1/20 0.33
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8945523 0.89 CYP2C9 (0.49) SKP2SPHK1CYP2C9CYP3A4SLC5A1
SCHEMBL8945496 0.87 SKP2 (0.48) SKP2SPHK1CYP2C9ALDH1A1MAPT
SCHEMBL8945346 0.86 SKP2 (0.47) SKP2SPHK1CYP2C9ALDH1A1MAPT
SCHEMBL8945151 0.86 ESR2 (0.44) SKP2SPHK1CYP3A4SLC5A1SLC5A2
SCHEMBL8945574 0.85 SPHK1 (0.46) SKP2SPHK1CYP2C9ALDH1A1MAPT
SCHEMBL8944995 0.85 SPHK1 (0.46) SKP2SPHK1CYP2C9ALDH1A1MAPT
SCHEMBL8945407 0.85 SPHK1 (0.46) SKP2SPHK1CYP2C9ALDH1A1MAPT
SCHEMBL8945508 0.84 SKP2 (0.41) SKP2CYP3A4ALDH1A1MAPTMEN1
SCHEMBL7753027 0.82 CYP3A4 (0.47) SPHK1CYP2C9CYP3A4ALDH1A1MAPT
SCHEMBL8765913 0.80 SKP2 (0.41) SKP2CYP3A4SLC5A2ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5501884-A Diamino compounds and their production method and liquid crystal alignment layers using the compounds CHISSO CORPORATION (JP) 1996-03-26 US disclosed