SCHEMBL8945151

SCHEMBL8945151

Cc1cc(Cc2ccc(C3CCC(C)CC3)cc2)ccc1N

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 2/20 0.44
SKP2 Q13309 1/20 0.41
CYP3A4 P08684 3/20 0.36
SLC5A1 P13866 2/20 0.36
SLC5A2 P31639 2/20 0.36
ALDH1A1 P00352 4/20 0.36
SPHK1 Q9NYA1 2/20 0.35
GAA P10253 3/20 0.35
KDM4E B2RXH2 2/20 0.35
MAPT P10636 2/20 0.35
ESR1 P03372 1/20 0.35
MEN1 O00255 1/20 0.35
POLB P06746 1/20 0.35
RAB9A P51151 1/20 0.35
KMT2A Q03164 1/20 0.35
TSHR P16473 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
CYP17A1 P05093 1/20 0.33
CYP19A1 P11511 1/20 0.33
CYP11B1 P15538 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8945508 0.87 SKP2 (0.41) ESR2SKP2CYP3A4ALDH1A1GAA
SCHEMBL8945135 0.86 SKP2 (0.42) ESR2SKP2CYP3A4SLC5A1SLC5A2
SCHEMBL8945422 0.84 ESR2 (0.42) ESR2CYP3A4SLC5A1SLC5A2ALDH1A1
SCHEMBL8945523 0.83 CYP2C9 (0.49) ESR2SKP2CYP3A4SLC5A1SLC5A2
SCHEMBL8945167 0.83 ESR2 (0.41) ESR2CYP3A4SLC5A1SLC5A2ALDH1A1
SCHEMBL8945496 0.81 SKP2 (0.48) ESR2SKP2ALDH1A1SPHK1MAPT
SCHEMBL7751598 0.81 ESR2 (0.52) ESR2CYP3A4SLC5A1SLC5A2ALDH1A1
SCHEMBL8945000 0.81 SPHK1 (0.41) ESR2CYP3A4SLC5A1SLC5A2ALDH1A1
SCHEMBL8945346 0.80 SKP2 (0.47) SKP2ALDH1A1SPHK1MAPTMEN1
SCHEMBL15043592 0.80 ESR2 (0.47) ESR2CYP3A4SLC5A1SLC5A2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5501884-A Diamino compounds and their production method and liquid crystal alignment layers using the compounds CHISSO CORPORATION (JP) 1996-03-26 US disclosed