SCHEMBL8946062

SCHEMBL8946062

C=C(C)C(=O)OCCN(C(=O)OC(C)(C)C)S(=O)(=O)c1ccc(C)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F2 P00734 3/20 0.45
STAT5B P51692 2/20 0.42
NR1D1 P20393 1/20 0.37
STAT3 P40763 1/20 0.37
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
POLB P06746 1/20 0.35
KEAP1 Q14145 1/20 0.34
NFE2L2 Q16236 1/20 0.34
MAPT P10636 2/20 0.34
TP53 P04637 1/20 0.34
LMNA P02545 2/20 0.33
TAS2R14 Q9NYV8 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
TSHR P16473 1/20 0.33
KDM4E B2RXH2 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HCRTR2 O43614 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8346204 0.87 CYP3A4 (0.42) CA1CA2POLBKEAP1NFE2L2
SCHEMBL8055654 0.84 POLB (0.43) CA1CA2POLBKEAP1NFE2L2
SCHEMBL8879054 0.80 STAT5B (0.45) F2STAT5BNR1D1STAT3POLB
SCHEMBL9181881 0.77 STAT5B (0.45) F2STAT5BNR1D1STAT3CA2
SCHEMBL9178323 0.76 STAT5B (0.44) F2STAT5BNR1D1STAT3POLB
SCHEMBL5708145 0.76 C5AR1 (0.49) F2STAT5BNR1D1STAT3KEAP1
SCHEMBL2960697 0.74 AGER (0.45) F2STAT5BNR1D1POLBKEAP1
SCHEMBL7067656 0.74 STAT5B (0.44) F2STAT5BNR1D1STAT3CA1
SCHEMBL5011784 0.73 CYP1A2 (0.40) CA1CA2POLBMAPTLMNA
SCHEMBL14327847 0.73 STAT5B (0.49) F2STAT5BSTAT3CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0602377-B1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions HOECHST AG (DE) 1996-10-09 EP disclosed
US-5529886-A PHOTOSENSITIVE MIXTURE OF A COMPOUND WHICH ON EXPOSURE TO ACTINIC RADIATION FORMS ACID, AND AN ACID-CLEAVABLE ACRYLATE HOMO OR COPOLYMER HOECHST AKTIENGESELLSCHAFT (DE) 1996-06-25 US disclosed
US-5442087-A Preparing offset printing plates and photoresists HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-15 US disclosed
EP-0602377-A1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions HOECHST AKTIENGESELLSCHAFT (DE) 1994-06-22 EP disclosed