SCHEMBL8946077

SCHEMBL8946077

C=C(C)C(=O)Oc1ccc(S(=O)(=O)N(C(=O)OC(C)(C)C)c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.46
ALDH1A1 P00352 2/20 0.45
KMT2A Q03164 4/20 0.43
MEN1 O00255 2/20 0.43
POLB P06746 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.41
THRB P10828 1/20 0.41
PTGES O14684 1/20 0.39
RAB9A P51151 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
MAPT P10636 1/20 0.38
TP53 P04637 2/20 0.38
F2 P00734 2/20 0.38
HSP90AA1 P07900 1/20 0.38
TSHR P16473 1/20 0.38
MMP13 P45452 1/20 0.37
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1858294 0.79 KMT2A (0.47) ALDH1A1KMT2AMEN1SMN1; SMN2THRB
SCHEMBL8752627 0.77 KMT2A (0.56) ALDH1A1KMT2AMEN1POLBRAB9A
SCHEMBL3275099 0.73 ALDH1A1 (0.56) ELANEALDH1A1KMT2APOLBSMN1; SMN2
SCHEMBL1856286 0.73 KMT2A (0.40) KMT2AMEN1POLBF2MMP13
SCHEMBL1232411 0.72 PKM (0.67) ELANEALDH1A1KMT2APOLBSMN1; SMN2
SCHEMBL5316222 0.72 KMT2A (0.74) ELANEALDH1A1KMT2AMEN1POLB
SCHEMBL1859337 0.72 ESR1 (0.39) KMT2AMEN1POLBNPSR1F2
SCHEMBL31220432 0.72 HSP90AA1 (0.54) ALDH1A1KMT2AMAPTTP53F2
SCHEMBL9915684 0.72 ELANE (0.64) ELANEALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL172511 0.72 ELANE (0.64) ELANEALDH1A1KMT2AMEN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0602377-B1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions HOECHST AG (DE) 1996-10-09 EP disclosed
US-5529886-A PHOTOSENSITIVE MIXTURE OF A COMPOUND WHICH ON EXPOSURE TO ACTINIC RADIATION FORMS ACID, AND AN ACID-CLEAVABLE ACRYLATE HOMO OR COPOLYMER HOECHST AKTIENGESELLSCHAFT (DE) 1996-06-25 US disclosed
US-5442087-A Preparing offset printing plates and photoresists HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-15 US disclosed
EP-0602377-A1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions HOECHST AKTIENGESELLSCHAFT (DE) 1994-06-22 EP disclosed