SCHEMBL8947490

SCHEMBL8947490

O=C1CCCC(=C/c2ccc(C(=O)O)cc2)/C1=C/c1ccc(C(=O)O)cc1

nearest known ligand 0.71

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.71
MAPT P10636 1/20 0.71
HPGD P15428 1/20 0.71
ALDH1A1 P00352 2/20 0.51
F2 P00734 14/20 0.51
F10 P00742 13/20 0.51
METAP1 P53582 1/20 0.50
KDM4E B2RXH2 1/20 0.49
RAB9A P51151 1/20 0.49
AKR1C3 P42330 1/20 0.49
AKR1C1 Q04828 1/20 0.49
PLAU P00749 1/20 0.48
HPN P05981 1/20 0.48
NPC1 O15118 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8947492 1.00 HTT (0.71) HTTMAPTHPGDALDH1A1F2
SCHEMBL8947501 0.90 MAPT (0.61) HTTMAPTHPGDALDH1A1F2
SCHEMBL8947502 0.90 MAPT (0.61) HTTMAPTHPGDALDH1A1F2
SCHEMBL30106702 0.83 MAPT (1.00) HTTMAPTHPGDF2F10
SCHEMBL2201906 0.82 ALDH1A1 (0.76) HTTMAPTHPGDALDH1A1AKR1C3
SCHEMBL5585178 0.82 ALDH1A1 (0.76) HTTMAPTHPGDALDH1A1AKR1C3
SCHEMBL625094 0.79 AKR1C3 (0.77) HTTMAPTHPGDALDH1A1F2
SCHEMBL29506220 0.75 CYP1A2 (0.71) MAPTALDH1A1METAP1RAB9ANPC1
SCHEMBL29506224 0.74 USP18 (0.52) HTTMAPTALDH1A1METAP1KDM4E
SCHEMBL17203060 0.73 AKR1C3 (0.46) HTTMAPTHPGDALDH1A1F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4863835-A UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1989-09-05 US claimed
US-5550002-A EXPOSING TO LIGHT PHOTOHARDENABLE PHOTOSENSITIVE LAYER ON LIGHT-SENSITIVE PLATE, APPLYING HEAT OR PRESSURE, REMOVING EXPOSED LAYER, EXPOSING UNEXPOSED LAYER TO HARDEN KONICA CORPORATION (JP) 1996-08-27 US disclosed
US-4863835-A UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1989-09-05 US disclosed
US-4684601-A UNSATURATED, HIGH MOLECULAR WEIGHT DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-08-04 US disclosed
US-4640887-A C,M UNSATURATED POLYESTERS WITH FREE CARBOXY GROUPS; PRINTING DURABLE PLATES WITH IMPROVED OLEOPHILICITY DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-02-03 US disclosed
US-4591545-A Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender DAINIPPON INK AND CHEMICALS, INC. (JP) 1986-05-27 US disclosed
EP-0037179-B1 DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES, A METHOD OF PLATE DEVELOPMENT, AND DEVELOPED PLATES MITSUBISHI KASEI CORPORATION (JP) 1985-05-29 EP disclosed
EP-0037179-A2 Developer composition for lithographic printing plates, a method of plate development, and developed plates MITSUBISHI KASEI CORPORATION (JP) 1981-10-07 EP disclosed
US-4258124-A Photosensitive composition MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1981-03-24 US disclosed