SCHEMBL8947501

SCHEMBL8947501

O=C1CCC(=C/c2ccc(C(=O)O)cc2)/C1=C/c1ccc(C(=O)O)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.61
HPGD P15428 1/20 0.61
HTT P42858 1/20 0.61
METAP1 P53582 1/20 0.53
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
F2 P00734 9/20 0.49
F10 P00742 8/20 0.49
PIM1 P11309 1/20 0.46
ALDH1A1 P00352 1/20 0.44
CSNK2A2 P19784 2/20 0.43
CSNK2B P67870 2/20 0.43
CSNK2A1 P68400 2/20 0.43
CSNK2A3 Q8NEV1 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
MYC P01106 1/20 0.43
IL1RN P18510 1/20 0.43
ERAP1 Q9NZ08 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8947502 1.00 MAPT (0.61) MAPTHPGDHTTMETAP1MEN1
SCHEMBL8947492 0.90 HTT (0.71) MAPTHPGDHTTMETAP1F2
SCHEMBL8947490 0.90 HTT (0.71) MAPTHPGDHTTMETAP1F2
SCHEMBL6851578 0.80 CYP1A2 (0.64) MAPTHPGDHTTMEN1KMT2A
SCHEMBL21539509 0.80 CYP1A2 (0.64) MAPTHPGDHTTMEN1KMT2A
SCHEMBL624285 0.77 HSD11B1 (0.67) MAPTMETAP1MEN1KMT2AF2
SCHEMBL30106702 0.76 MAPT (1.00) MAPTHPGDHTTF2F10
SCHEMBL10620169 0.73 IGF1R (0.47) MAPTHPGDMEN1KMT2AF2
SCHEMBL10620175 0.73 IGF1R (0.47) MAPTHPGDMEN1KMT2AF2
SCHEMBL5585178 0.70 ALDH1A1 (0.76) MAPTHPGDHTTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4863835-A UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1989-09-05 US claimed
US-5550002-A EXPOSING TO LIGHT PHOTOHARDENABLE PHOTOSENSITIVE LAYER ON LIGHT-SENSITIVE PLATE, APPLYING HEAT OR PRESSURE, REMOVING EXPOSED LAYER, EXPOSING UNEXPOSED LAYER TO HARDEN KONICA CORPORATION (JP) 1996-08-27 US disclosed
US-4863835-A UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1989-09-05 US disclosed
US-4684601-A UNSATURATED, HIGH MOLECULAR WEIGHT DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-08-04 US disclosed
US-4640887-A C,M UNSATURATED POLYESTERS WITH FREE CARBOXY GROUPS; PRINTING DURABLE PLATES WITH IMPROVED OLEOPHILICITY DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-02-03 US disclosed
US-4591545-A Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender DAINIPPON INK AND CHEMICALS, INC. (JP) 1986-05-27 US disclosed
EP-0037179-A2 Developer composition for lithographic printing plates, a method of plate development, and developed plates MITSUBISHI KASEI CORPORATION (JP) 1981-10-07 EP disclosed
US-4271261-A PHOTOSENSITIVE POLYMER MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1981-06-02 US disclosed