SCHEMBL896085

SCHEMBL896085

C=CO[C](C)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
AKT1 P31749 1/20 0.41
CES2 O00748 2/20 0.38
CES1 P23141 2/20 0.38
TSHR P16473 3/20 0.37
LMNA P02545 3/20 0.36
MAPK1 P28482 2/20 0.36
HTT P42858 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ELANE P08246 2/20 0.35
F2 P00734 1/20 0.34
ALDH1A1 P00352 4/20 0.33
DAO P14920 1/20 0.33
NAPRT Q6XQN6 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ESR1 P03372 1/20 0.33
G6PC1 P35575 1/20 0.33
KDM1A O60341 1/20 0.33
POLB P06746 1/20 0.33
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid Vinyl Ester SCHEMBL27487096 0.77 TSHR (0.52) AKT1CES2CES1TSHRLMNA
Benzoic Acid Vinyl Ester SCHEMBL2594239 0.77 TSHR (0.52) AKT1CES2CES1TSHRLMNA
Benzoic Acid Vinyl Ester SCHEMBL27612064 0.76 LMNA (0.54) AKT1CES2CES1TSHRLMNA
Benzoic Acid SCHEMBL27781747 0.75 TSHR (0.54) AKT1CES2CES1TSHRLMNA
Benzoic Acid Vinyl Ester SCHEMBL28299445 0.75 TSHR (0.50) AKT1CES2CES1TSHRLMNA
SCHEMBL21943252 0.74 ELANE (0.37) AKT1CES2CES1TSHRLMNA
Benzoic Acid Vinyl Ester SCHEMBL6550693 0.74 TSHR (0.48) AKT1CES2CES1TSHRLMNA
SCHEMBL2383855 0.74 AKT1 (0.44) AKT1CES2CES1TSHRLMNA
SCHEMBL4787335 0.73 AKT1 (0.41) AKT1CES2CES1TSHRLMNA
Benzoic Acid Vinyl Ester SCHEMBL14903 0.73 LMNA (0.56) AKT1CES2CES1TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170002221-A1 UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2017-01-05 US claimed
US-12036806-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-12006440-B2 Radiation curable inkjet inks for interior decoration AGFA NV (BE) 2024-06-11 US disclosed
US-20240181794-A1 Ink Jet Method And Ink Jet Apparatus SEIKO EPSON CORP (JP) 2024-06-06 US disclosed
US-11981823-B2 Radiation-curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-14 US disclosed
EP-4364950-A1 ACTINIC RAY-CURABLE INKJET INK COMPOSITION Sakata INX Corporation (JP) 2024-05-08 EP disclosed
US-11952501-B2 Ink set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2024-04-09 US disclosed
US-11912051-B2 Ink jet method and ink jet apparatus SEIKO EPSON CORPORATION (JP) 2024-02-27 US disclosed
US-20240059075-A1 PHOTO-CURABLE INK JET INK SET AND INK JET RECORDING METHOD USING THE SAME SEIKO EPSON CORPORATION (JP) 2024-02-22 US disclosed
US-20130010039-A1 Photocurable Ink Composition for Ink Jet Recording and Ink Jet Recording Method SEIKO EPSON CORPORATION (JP) 2013-01-10 US disclosed
EP-2543707-A1 Photocurable ink composition for ink jet recording and ink jet recording method Seiko Epson Corporation (JP) 2013-01-09 EP disclosed
US-20120274717-A1 PHOTOCURABLE INK COMPOSITION, RECORDING METHOD, RECORDING APPARATUS, PHOTOCURABLE INK JET RECORDING INK COMPOSITION, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-11-01 US disclosed
US-20120147095-A1 INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET SEIKO EPSON CORPORATION (JP) 2012-06-14 US disclosed
US-20120083545-A1 ULTRAVIOLET-CURABLE INK JET INK COMPOSITION SEIKO EPSON CORPORATION 2012-04-05 US disclosed
EP-2348081-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Cheil Industries Inc. (KR) 2011-07-27 EP disclosed
EP-1308434-B1 (Meth)acryloyl group-containing compound and method for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-03-15 EP disclosed
US-6887946-B2 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. (JP) 2005-05-03 US disclosed
US-20030134926-A1 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. 2003-07-17 US disclosed
EP-1308434-A1 (Meth)acryloyl group-containing compound and method for producing the same Nippon Shokubai Co., Ltd. (JP) 2003-05-07 EP disclosed