SCHEMBL896087

SCHEMBL896087

[CH2]c1ccccc1COC=C

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8602403 0.86 IDO1 (0.38) MEN1LMNAKMT2A
SCHEMBL29728038 0.86 IDO1 (0.38) MEN1LMNAKMT2A
SCHEMBL10562784 0.81 SRC (0.35)
SCHEMBL232812 0.77 IDO1 (0.38) MEN1KMT2A
SCHEMBL28923748 0.77 ALDH1A1 (0.40) MEN1LMNAKMT2A
SCHEMBL896089 0.77 CDK4 (0.42) KMT2A
SCHEMBL14440983 0.77 IDO1 (0.55)
SCHEMBL8468499 0.77 APOBEC3G (0.39) MEN1LMNAKMT2A
SCHEMBL8608643 0.77 IDO1 (0.55)
SCHEMBL12794935 0.76 HTT (0.33) MEN1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 272 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170002221-A1 UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2017-01-05 US claimed
US-12036806-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
US-20240218244-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-12006440-B2 Radiation curable inkjet inks for interior decoration AGFA NV (BE) 2024-06-11 US disclosed
US-20240181794-A1 Ink Jet Method And Ink Jet Apparatus SEIKO EPSON CORP (JP) 2024-06-06 US disclosed
US-20240166791-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-23 US disclosed
US-11981823-B2 Radiation-curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-14 US disclosed
EP-4364950-A1 ACTINIC RAY-CURABLE INKJET INK COMPOSITION Sakata INX Corporation (JP) 2024-05-08 EP disclosed
US-11952501-B2 Ink set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2024-04-09 US disclosed
US-20120147095-A1 INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET SEIKO EPSON CORPORATION (JP) 2012-06-14 US disclosed
US-20120133060-A1 RADIATION-CURABLE INK JET COMPOSITION, RECORDING MATTER, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-05-31 US disclosed
US-20120083545-A1 ULTRAVIOLET-CURABLE INK JET INK COMPOSITION SEIKO EPSON CORPORATION 2012-04-05 US disclosed
EP-2348081-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Cheil Industries Inc. (KR) 2011-07-27 EP disclosed
US-20110009586-A1 POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE NIPPON SHOKUBAI CO., LTD. (JP) 2011-01-13 US disclosed
US-20080166495-A1 IMAGE FORMING METHOD AND APPARATUS FUJIFILM CORPORATION (JP) 2008-07-10 US disclosed
EP-1308434-B1 (Meth)acryloyl group-containing compound and method for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-03-15 EP disclosed
US-6887946-B2 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. (JP) 2005-05-03 US disclosed
US-20030134926-A1 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. 2003-07-17 US disclosed
EP-1308434-A1 (Meth)acryloyl group-containing compound and method for producing the same Nippon Shokubai Co., Ltd. (JP) 2003-05-07 EP disclosed