SCHEMBL896089

SCHEMBL896089

C=COCc1ccccc1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDK4 P11802 2/20 0.42
CCND1 P24385 2/20 0.42
TAAR1 Q96RJ0 1/20 0.42
MAOB P27338 1/20 0.41
ADRA2A P08913 1/20 0.40
ADRA2B P18089 1/20 0.40
ADRA2C P18825 1/20 0.40
CCNB2 O95067 1/20 0.39
CDK1 P06493 1/20 0.39
CCNB1 P14635 1/20 0.39
CCNB3 Q8WWL7 1/20 0.39
CYP2A13 Q16696 1/20 0.38
ALDH1A1 P00352 1/20 0.37
CHRM2 P08172 1/20 0.36
PTGS1 P23219 1/20 0.36
PTGS2 P35354 1/20 0.36
ACHE P22303 2/20 0.36
TSHR P16473 1/20 0.36
MAPT P10636 1/20 0.36
GPR84 Q9NQS5 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29728038 0.84 IDO1 (0.38) ALDH1A1TSHRMAPTKMT2A
SCHEMBL8602403 0.84 IDO1 (0.38) ALDH1A1TSHRMAPTKMT2A
SCHEMBL1525831 0.81 CDK4 (0.44) CDK4CCND1TAAR1MAOBADRA2A
SCHEMBL133172 0.79 CDK4 (0.50) CDK4CCND1TAAR1MAOBADRA2A
SCHEMBL256804 0.78 TAAR1 (0.48) CDK4CCND1TAAR1MAOBADRA2A
SCHEMBL22697030 0.77 SCN8A (0.33)
SCHEMBL896087 0.77 MEN1 (0.34) KMT2A
SCHEMBL14306607 0.76 IDO1 (0.58) TAAR1ALDH1A1CHRM2ACHEMAPT
SCHEMBL11499740 0.76 HTR2A (0.46) TSHR
SCHEMBL5597285 0.76 ALDH1A1 (0.45) CDK4CCND1TAAR1MAOBADRA2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 259 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170002221-A1 UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2017-01-05 US claimed
US-12036806-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
US-20240218244-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-12006440-B2 Radiation curable inkjet inks for interior decoration AGFA NV (BE) 2024-06-11 US disclosed
US-20240181794-A1 Ink Jet Method And Ink Jet Apparatus SEIKO EPSON CORP (JP) 2024-06-06 US disclosed
US-20240166791-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-23 US disclosed
US-11981823-B2 Radiation-curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-14 US disclosed
EP-4364950-A1 ACTINIC RAY-CURABLE INKJET INK COMPOSITION Sakata INX Corporation (JP) 2024-05-08 EP disclosed
US-11952501-B2 Ink set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2024-04-09 US disclosed
EP-1308434-B1 (Meth)acryloyl group-containing compound and method for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-03-15 EP disclosed
EP-1562696-A2 AQUEOUS EMULSION POLYMER AS DISPERSANT Efka Additives B.V. (NL) 2005-08-17 EP disclosed
US-6887946-B2 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. (JP) 2005-05-03 US disclosed
US-20040236007-A1 Levelling agent and anti-cratering agent CIBA SPECIALTY CHEMICALS CORPORATION 2004-11-25 US disclosed
EP-1444302-A1 LEVELLING AGENT AND ANTI-CRATERING AGENT Efka Additives B.V. (NL) 2004-08-11 EP disclosed
WO-2004045755-A2 AQUEOUS EMULSION POLYMER AS DISPERSANT EFKA ADDITIVES B.V. (NL) 2004-06-03 WO disclosed
US-20030134926-A1 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. 2003-07-17 US disclosed
EP-1308434-A1 (Meth)acryloyl group-containing compound and method for producing the same Nippon Shokubai Co., Ltd. (JP) 2003-05-07 EP disclosed
WO-2003033603-A1 LEVELLING AGENT AND ANTI-CRATERING AGENT EFKA ADDITIVES B.V. (NL) 2003-04-24 WO disclosed
US-4075237-A Perfluorinated esters of fumaric acid and certain other ethylenically unsaturated poly-basic acid and soil repellant polymers thereof GEIGY CHEMICAL CORPORATION (US) 1978-02-21 US disclosed