SCHEMBL896139

SCHEMBL896139

CCCCOCOC(C)=O

nearest known ligand 0.67

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.67
CES2 O00748 2/20 0.47
TSHR P16473 7/20 0.46
ATM Q13315 1/20 0.45
LMNA P02545 1/20 0.44
HSD17B10 Q99714 1/20 0.44
HPGD P15428 1/20 0.42
FAAH O00519 1/20 0.40
HCAR2 Q8TDS4 1/20 0.39
NAAA Q02083 1/20 0.39
CYP3A4 P08684 1/20 0.39
DGKA P23743 1/20 0.39
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9192471 0.96 ALDH1A1 (0.61) ALDH1A1CES2TSHRATMLMNA
SCHEMBL18826709 0.93 ALDH1A1 (0.58) ALDH1A1CES2TSHRLMNAHSD17B10
SCHEMBL7175331 0.91 CES2 (0.59) ALDH1A1CES2TSHRFAAHHCAR2
SCHEMBL895946 0.91 CES2 (0.59) ALDH1A1CES2TSHRFAAHHCAR2
SCHEMBL3392552 0.88 ALDH1A1 (0.48) ALDH1A1CES2TSHRLMNAHSD17B10
SCHEMBL3392629 0.86 ALDH1A1 (0.46) ALDH1A1CES2TSHRLMNAHSD17B10
SCHEMBL3388943 0.86 ALDH1A1 (0.46) ALDH1A1CES2TSHRLMNAHSD17B10
SCHEMBL3391086 0.86 ALDH1A1 (0.46) ALDH1A1CES2TSHRLMNAHSD17B10
SCHEMBL760521 0.86
SCHEMBL3391150 0.86 ALDH1A1 (0.46) ALDH1A1CES2TSHRLMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108604061-B Cured film and positive photosensitive resin composition 东丽株式会社 2021-07-16 CN disclosed
CN-110730790-B Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same 中央硝子株式会社 2021-06-15 CN disclosed
CN-107272342-B Negative photosensitive resin composition 东友精细化工有限公司 2021-03-05 CN disclosed
CN-107073516-B Method for producing structure having concave pattern, resin composition, method for forming conductive film, electronic circuit, and electronic device JSR株式会社 2020-09-15 CN disclosed
CN-107949876-B Window substrate, method of manufacturing the same, and image display device having the same 东友精细化工有限公司 2020-07-31 CN disclosed
CN-110730790-A Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same 中央硝子株式会社 2020-01-24 CN disclosed
CN-105143977-B Method for producing substrate having concave pattern, composition, method for forming conductive film, electronic circuit, and electronic device JSR株式会社 2020-01-07 CN disclosed
CN-104808439-B Photoresist composition and method for manufacturing thin film transistor substrate 三星显示有限公司 2019-12-31 CN disclosed
CN-104950578-B Colored photosensitive resin composition and color filter produced therefrom 东友精细化工有限公司 2019-12-06 CN disclosed
CN-105319837-B Photoresist pattern forming method 东友精细化工有限公司 2019-10-25 CN disclosed
CN-101262957-A Process for producing articles having an electrically conductive coating A M RAMP & CO GMBH (DE) 2008-09-10 CN disclosed
EP-1917111-A1 PROCESS FOR PRODUCING ARTICLES HAVING AN ELECTRICALLY CONDUCTIVE COATING A.M. Ramp & Co. GmbH (DE) 2008-05-07 EP disclosed
US-20080081207-A1 Optical multilayer reflective film, and aligned metal particle film and manufacturing process therefor UBE INDUSTRIES, LTD. (JP) 2008-04-03 US disclosed
US-20080053467-A1 Cigarette Filter Material and Cigarette Filter DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2008-03-06 US disclosed
EP-1839507-A1 MATERIAL FOR CIGARETTE FILER AND CIGARETTE FILTER DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-03 EP disclosed
WO-2007022810-A1 PROCESS FOR PRODUCING ARTICLES HAVING AN ELECTRICALLY CONDUCTIVE COATING A.M. RAMP & CO. GMBH (DE) 2007-03-01 WO disclosed
CN-1818778-A Photosensitive resin composition, thin film panel and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO LTD (KR) 2006-08-16 CN disclosed
US-20060177767-A1 Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. 2006-08-10 US disclosed
CN-1678596-A Novel 2-arylthiazole compounds as PPAR alpha and PPAR gamma agonists HOFFMANN LA ROCHE (CH) 2005-10-05 CN disclosed
US-5128234-A PRODUCTION OF PHOTOPOLYMERIC FLEXOGRAPHIC RELIEF PRINTING PLATES BASF AKTIENGESELLSCHAFT (DE) 1992-07-07 US disclosed