⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2030791 | 0.71 | — | — | |
| SCHEMBL8025784 | 0.69 | — | — | |
| SCHEMBL689258 | 0.63 | — | — | |
| SCHEMBL926380 | 0.62 | — | — | |
| SCHEMBL11647862 | 0.62 | — | — | |
| SCHEMBL8962844 | 0.62 | — | — | |
| SCHEMBL272918 | 0.61 | — | — | |
| SCHEMBL8200530 | 0.61 | — | — | |
| SCHEMBL21641959 | 0.61 | — | — | |
| SCHEMBL3625957 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116560188-B | Photosensitive resin composition, photosensitive resin sheet and application thereof | 波米科技有限公司 | 2024-02-13 | — | — | CN | claimed |
| CN-116560188-A | Photosensitive resin composition, photosensitive resin sheet and application thereof | 波米科技有限公司 | 2023-08-08 | — | — | CN | claimed |
| CN-115639724-B | Preparation method and application of photosensitive resin composition | 波米科技有限公司 | 2023-08-08 | — | — | CN | claimed |
| CN-115639724-A | Preparation method and application of photosensitive resin composition | 波米科技有限公司 | 2023-01-24 | — | — | CN | claimed |
| EP-0467561-B1 | Photosensitive resin composition for forming a polyimide film pattern | TOSHIBA KK (JP) | 1995-10-18 | — | — | EP | claimed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-116560188-B | Photosensitive resin composition, photosensitive resin sheet and application thereof | 波米科技有限公司 | 2024-02-13 | — | — | CN | disclosed |
| CN-108165281-B | Liquid crystal aligning agent and preparation method and application thereof | 常州市尚科新材料有限公司 | 2023-11-24 | — | — | CN | disclosed |
| CN-115639724-B | Preparation method and application of photosensitive resin composition | 波米科技有限公司 | 2023-08-08 | — | — | CN | disclosed |
| CN-116560188-A | Photosensitive resin composition, photosensitive resin sheet and application thereof | 波米科技有限公司 | 2023-08-08 | — | — | CN | disclosed |
| CN-116116235-B | Reverse osmosis membrane with self-healing function and preparation method thereof | 中复新水源科技有限公司 | 2023-08-01 | — | — | CN | disclosed |
| CN-116116235-A | Reverse osmosis membrane with self-healing function and preparation method thereof | 中复新水源科技有限公司 | 2023-05-16 | — | — | CN | disclosed |
| CN-106751826-A | A kind of activeness and quietness self-curing hard polyimide foaming and preparation method thereof | 自贡中天胜新材料科技有限公司 | 2017-05-31 | — | — | CN | disclosed |
| EP-3126415-A1 | SILICONE ACRYLAMIDE COPOLYMER | Johnson & Johnson Vision Care Inc. (US) | 2017-02-08 | — | — | EP | disclosed |
| WO-2015153403-A1 | SILICONE ACRYLAMIDE COPOLYMER | JOHNSON & JOHNSON VISION CARE, INC. (US) | 2015-10-08 | — | — | WO | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| EP-0137655-B1 | RADIATION-SENSITIVE POLYMER COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 1988-12-28 | — | — | EP | disclosed |
| US-4783391-A | Radiation-sensitive polyamide polymer composition with anthraquinone monoazide | TORAY INDUSTRIES, INC. (JP) | 1988-11-08 | — | — | US | disclosed |
| EP-0119719-B1 | RADIATION SENSITIVE POLYMER COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 1987-05-06 | — | — | EP | disclosed |
| US-4608333-A | INCREASED PHOTOSENSITIVITY BY INCLUDING AN AROMATIC SECONDARY OR TERTIARY AMINE WITH AN ACRYLIC MONOMER AND A POLYIMIDE-CURING POLYAMIDE | TORAY INDUSTRIES, INC. (JP) | 1986-08-26 | — | — | US | disclosed |