Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 | Q14145 | 1/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1578240 | 0.89 | KEAP1 (0.49) | KEAP1 | |
| SCHEMBL27790164 | 0.84 | KEAP1 (0.55) | KEAP1ESR1ESR2 | |
| SCHEMBL31738884 | 0.84 | CYP2C19 (0.54) | CYP3A4CYP2C19TDP1 | |
| SCHEMBL147085 | 0.84 | CYP2C19 (0.54) | CYP3A4CYP2C19TDP1 | |
| SCHEMBL5699549 | 0.83 | AKR1B1 (0.57) | CYP2C19ESR1ESR2TDP1 | |
| SCHEMBL7918865 | 0.82 | CYP2C19 (0.52) | CYP3A4CYP2C19TDP1 | |
| Hydrogen Sulfide SCHEMBL28838423 | 0.82 | CYP2C19 (0.52) | CYP3A4CYP2C19TDP1 | |
| SCHEMBL7918863 | 0.82 | CYP2C19 (0.52) | CYP3A4CYP2C19TDP1 | |
| SCHEMBL4651451 | 0.81 | AKR1B1 (0.49) | CYP3A4CYP2C19TDP1 | |
| SCHEMBL9529062 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 570 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100384906-C | Polycarbonate copolymers having improved hydrolytic stability | GEN ELECTRIC (US) | 2008-04-30 | — | — | CN | claimed |
| CN-1273515-C | Melt polycarbonate catalyst system | GEN ELECTRIC (US) | 2006-09-06 | — | — | CN | claimed |
| CN-1541239-A | Melt Polycarbonate Catalyst System | ͨ�õ�����˾ | 2004-10-27 | — | — | CN | claimed |
| CN-1500105-A | Melt polycarbonate catalyst systems | ͨ�õ�����˾ | 2004-05-26 | — | — | CN | claimed |
| CN-1492897-A | Melt polycarbonate catalyst system | ͨ�õ�����˾ | 2004-04-28 | — | — | CN | claimed |
| US-5258281-A | Light sensitive silver halide multilayer elements with dyes and heat development accelerators | CANON KABUSHIKI KAISHA (JP) | 1993-11-02 | — | — | US | claimed |
| EP-0486246-A1 | Heat-developable photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1992-05-20 | — | — | EP | claimed |
| CN-107849167-B | Method for producing polymer for electronic material and polymer for electronic material obtained by the production method | 丸善石油化学株式会社 | 2021-02-23 | — | — | CN | disclosed |
| US-10766973-B2 | Method for producing polymer for electronic material and polymer for electronic material obtained by the production method | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2020-09-08 | — | — | US | disclosed |
| WO-2020021717-A1 | DRY RESIST FILM, SOLDER RESIST, PRINTED WIRING BOARD WITH ELECTROMAGNETIC WAVE SHIELD SHEET AND METHOD FOR MANUFACTURING SAME, AND ELECTRONIC DEVICE | 東洋インキＳＣホールディングス株式会社 | 2020-01-30 | — | — | WO | disclosed |
| CN-110382592-A | Copolycarbonate, the product formed by it and manufacturing method | 沙特基础工业全球技术有限公司 | 2019-10-25 | — | — | CN | disclosed |
| CN-105102538-B | Stabilisation polycarbonate Alloys containing post-consumer recycled plastic | 沙特基础全球技术有限公司 | 2019-09-03 | — | — | CN | disclosed |
| CN-104541205-B | Resist underlayer film forming composition containing novolac resin having polynuclear phenol | 日产化学工业株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-1111254-A | Method for making polycarbonates | GEN ELECTRIC (US) | 1995-11-08 | — | — | CN | disclosed |
| CN-1098419-A | The preparation method of polycarbonate | GEN ELECTRIC (US) | 1995-02-08 | — | — | CN | disclosed |
| US-5262295-A | Biphenyldihydroxide reducing agent for silver halide emulsion layers | CANON KABUSHIKI KAISHA (JP) | 1993-11-16 | — | — | US | disclosed |
| US-5258281-A | Light sensitive silver halide multilayer elements with dyes and heat development accelerators | CANON KABUSHIKI KAISHA (JP) | 1993-11-02 | — | — | US | disclosed |
| EP-0509740-A1 | Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1992-10-21 | — | — | EP | disclosed |
| EP-0505155-A1 | Heat-developable masking layer | CANON KABUSHIKI KAISHA (JP) | 1992-09-23 | — | — | EP | disclosed |
| EP-0486246-A1 | Heat-developable photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1992-05-20 | — | — | EP | disclosed |