SCHEMBL896416

SCHEMBL896416

C=COCc1cccc(C)c1

nearest known ligand 0.58

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.58
MAOB P27338 6/20 0.49
MAOA P21397 2/20 0.47
TAAR1 Q96RJ0 1/20 0.46
TP53 P04637 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
ALDH1A1 P00352 1/20 0.41
CYP2D6 P10635 1/20 0.41
ACHE P22303 2/20 0.41
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
MMP12 P39900 1/20 0.40
CTBP2 P56545 1/20 0.40
GPR84 Q9NQS5 1/20 0.40
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL869687 0.86 IDO1 (0.38) IDO1MAOB
SCHEMBL3236884 0.81 TAAR1 (0.52) IDO1MAOBMAOATAAR1TP53
SCHEMBL1822742 0.81 IDO1 (0.58) IDO1MAOBMAOATAAR1ACHE
SCHEMBL30253988 0.79 IDO1 (0.67) IDO1MAOBMAOATAAR1ALDH1A1
SCHEMBL12379 0.79 IDO1 (0.67) IDO1MAOBMAOATAAR1ALDH1A1
SCHEMBL896415 0.78 IDO1 (0.33) IDO1MAOB
SCHEMBL10204865 0.78 IDO1 (0.55) IDO1MAOBMAOATAAR1TP53
SCHEMBL1145657 0.78 IDO1 (0.64) IDO1MAOBMAOATAAR1ALDH1A1
M-Xylene SCHEMBL17601872 0.78 ACHE (0.52) IDO1TAAR1TP53TDP1ALDH1A1
Fluoride SCHEMBL27638420 0.78 IDO1 (0.64) IDO1MAOBMAOATAAR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 235 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170002221-A1 UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2017-01-05 US claimed
US-12036806-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
US-20240218244-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-12006440-B2 Radiation curable inkjet inks for interior decoration AGFA NV (BE) 2024-06-11 US disclosed
US-20240181794-A1 Ink Jet Method And Ink Jet Apparatus SEIKO EPSON CORP (JP) 2024-06-06 US disclosed
US-20240166791-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-23 US disclosed
US-11981823-B2 Radiation-curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-14 US disclosed
EP-4364950-A1 ACTINIC RAY-CURABLE INKJET INK COMPOSITION Sakata INX Corporation (JP) 2024-05-08 EP disclosed
WO-2024084904-A1 CURABLE COMPOSITION, CURED FILM, AND DISPLAY DEVICE 住友化学株式会社 2024-04-25 WO disclosed
EP-2543707-A1 Photocurable ink composition for ink jet recording and ink jet recording method Seiko Epson Corporation (JP) 2013-01-09 EP disclosed
US-20120274717-A1 PHOTOCURABLE INK COMPOSITION, RECORDING METHOD, RECORDING APPARATUS, PHOTOCURABLE INK JET RECORDING INK COMPOSITION, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-11-01 US disclosed
US-20120147095-A1 INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET SEIKO EPSON CORPORATION (JP) 2012-06-14 US disclosed
US-20120083545-A1 ULTRAVIOLET-CURABLE INK JET INK COMPOSITION SEIKO EPSON CORPORATION 2012-04-05 US disclosed
EP-2348081-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Cheil Industries Inc. (KR) 2011-07-27 EP disclosed
US-20110009586-A1 POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE NIPPON SHOKUBAI CO., LTD. (JP) 2011-01-13 US disclosed
EP-1308434-B1 (Meth)acryloyl group-containing compound and method for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-03-15 EP disclosed
US-6887946-B2 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. (JP) 2005-05-03 US disclosed
US-20030134926-A1 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. 2003-07-17 US disclosed
EP-1308434-A1 (Meth)acryloyl group-containing compound and method for producing the same Nippon Shokubai Co., Ltd. (JP) 2003-05-07 EP disclosed