Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AGXT | P21549 | 2/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | CA9 | Q16790 | 1/20 | 0.44 |
| ▸ | IDO1 | P14902 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 3/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.40 |
| ▸ | CASP3 | P42574 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.40 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.40 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 4/20 | 0.39 |
| ▸ | MAOA | P21397 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20090497 | 0.89 | AGXT (0.42) | AGXTCA1CA2CA9IDO1 | |
| SCHEMBL12172133 | 0.89 | HPGD (0.44) | AGXTCA1CA2CA9NPC1 | |
| SCHEMBL5479582 | 0.88 | IDO1 (0.35) | AGXTCA2CA9IDO1SMN1; SMN2 | |
| SCHEMBL14541795 | 0.84 | AGXT (0.39) | AGXTCA1CA2CA9KCNH2 | |
| SCHEMBL2516309 | 0.79 | MAOB (0.38) | AGXTNPC1RAB9ASMN1; SMN2MAOB | |
| SCHEMBL17615186 | 0.79 | AGXT (0.45) | AGXTCA1CA2CA9IDO1 | |
| SCHEMBL896480 | 0.79 | ALDH1A1 (0.30) | IDO1SMN1; SMN2ALDH1A1 | |
| SCHEMBL8456421 | 0.79 | IDO1 (0.50) | CA1CA2CA9IDO1NPC1 | |
| SCHEMBL1618666 | 0.78 | CYP1A2 (0.45) | AGXTIDO1KCNH2CYP1A2CYP2A6 | |
| SCHEMBL917734 | 0.78 | SMN1; SMN2 (0.59) | AGXTCA1CA2CA9IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170002221-A1 | UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2017-01-05 | — | — | US | claimed |
| US-8895691-B2 | Acid-labile polymers and monomers for their construction | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2014-11-25 | — | — | US | claimed |
| US-20110152496-A1 | ACID-LABILE POLYMERS AND MONOMERS FOR THEIR CONSTRUCTION | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2011-06-23 | — | — | US | claimed |
| JP-61254607-A | — | — | None | — | — | JP | disclosed |
| US-12036806-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240218244-A1 | CURED FILM AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| WO-2024135086-A1 | PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE | 株式会社ダイセル | 2024-06-27 | — | — | WO | disclosed |
| US-20240181794-A1 | Ink Jet Method And Ink Jet Apparatus | SEIKO EPSON CORP (JP) | 2024-06-06 | — | — | US | disclosed |
| WO-2024111420-A1 | ALKALI-SOLUBLE RESIN, LIGHT-SENSITIVE RESIN COMPOSITION, METHODS RESPECTIVELY FOR PRODUCING THOSE, AND USE OF THOSE | 株式会社日本触媒 | 2024-05-30 | — | — | WO | disclosed |
| US-20240166791-A1 | CURED FILM AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-05-23 | — | — | US | disclosed |
| US-11981823-B2 | Radiation-curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-14 | — | — | US | disclosed |
| EP-1308434-A1 | (Meth)acryloyl group-containing compound and method for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2003-05-07 | — | — | EP | disclosed |
| EP-0496828-A4 | VINYL ETHERS SYNTHESIZED FROM HYDROXYLATED VINYL ETHERS AND POLYEPOXIDES | — | 1993-03-31 | — | — | EP | disclosed |
| EP-0496828-A1 | VINYL ETHERS SYNTHESIZED FROM HYDROXYLATED VINYL ETHERS AND POLYEPOXIDES | ISP INVESTMENTS INC. (US) | 1992-08-05 | — | — | EP | disclosed |
| US-5098791-A | Substrate coated with epoxy vinyl ether | ISP INVESTMENTS INC. (US) | 1992-03-24 | — | — | US | disclosed |
| US-5096783-A | Substrate coated with epoxy vinyl ether | ISP INVESTMENTS INC. (US) | 1992-03-17 | — | — | US | disclosed |
| WO-1991005814-A1 | VINYL ETHERS SYNTHESIZED FROM HYDROXYLATED VINYL ETHERS AND POLYEPOXIDES | GAF CHEMICALS CORPORATION (US) | 1991-05-02 | — | — | WO | disclosed |
| US-4980430-A | Epoxy vinyl ethers and synthesis of an epoxy vinyl ether from a hydroxylated vinyl ether and a diepoxide | GAF CHEMICALS CORPORATION (US) | 1990-12-25 | — | — | US | disclosed |
| US-4980428-A | Epoxy vinyl ethers and synthesis of an epoxy vinyl ether from a hydroxylated vinyl ether and a polyepoxide | GAF CHEMICALS CORPORATION (US) | 1990-12-25 | — | — | US | disclosed |
| JP-S61254607-A | PRODUCTION OF POLYVINYL ALCOHOL | HIGASHIMURA TOSHINOBU | 1986-11-12 | — | — | JP | disclosed |