SCHEMBL896480

SCHEMBL896480

[CH2]c1ccc(COC=C)cc1

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30
ALOX15 P16050 1/20 0.30
TSHR P16473 1/20 0.30
ALOX12 P18054 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
IDO1 P14902 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5479582 0.90 IDO1 (0.35) ALDH1A1TP53CYP3A4ALOX15TSHR
SCHEMBL8456421 0.81 IDO1 (0.50) ALDH1A1CYP3A4ALOX15IDO1
SCHEMBL410857 0.79 IDO1 (0.52) SMN1; SMN2IDO1
SCHEMBL896481 0.79 AGXT (0.52) ALDH1A1SMN1; SMN2IDO1
SCHEMBL17592785 0.79 IDO1 (0.52) SMN1; SMN2IDO1
SCHEMBL17190074 0.79
SCHEMBL2521337 0.79 ALDH1A1 (0.50) ALDH1A1TSHR
SCHEMBL3157370 0.79 LTA4H (0.39) ALDH1A1TSHRSMN1; SMN2IDO1
SCHEMBL28910550 0.79 CYP3A4 (0.32) CYP3A4IDO1
SCHEMBL2612240 0.79 ALDH1A1 (0.44) ALDH1A1CYP3A4ALOX15TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 348 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170002221-A1 UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2017-01-05 US claimed
US-12036806-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
US-20240218244-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-20240181794-A1 Ink Jet Method And Ink Jet Apparatus SEIKO EPSON CORP (JP) 2024-06-06 US disclosed
WO-2024111420-A1 ALKALI-SOLUBLE RESIN, LIGHT-SENSITIVE RESIN COMPOSITION, METHODS RESPECTIVELY FOR PRODUCING THOSE, AND USE OF THOSE 株式会社日本触媒 2024-05-30 WO disclosed
CN-114423742-B Benzotriazole-based compound, light absorber and resin composition 三井化学株式会社 2024-05-28 CN disclosed
US-20240166791-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-23 US disclosed
US-11981823-B2 Radiation-curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-14 US disclosed
EP-4364950-A1 ACTINIC RAY-CURABLE INKJET INK COMPOSITION Sakata INX Corporation (JP) 2024-05-08 EP disclosed
US-20030199655-A1 Reactive diluent and curable resin composition NIPPON SHOKUBAI CO., LTD. 2003-10-23 US disclosed
US-20030134926-A1 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. 2003-07-17 US disclosed
EP-1308434-A1 (Meth)acryloyl group-containing compound and method for producing the same Nippon Shokubai Co., Ltd. (JP) 2003-05-07 EP disclosed
EP-0534257-B1 Salicylic acid derivatives, the process for preparing the same and the heat-sensitive recording materials comprising thereof MITSUI TOATSU CHEMICALS (JP) 1997-03-12 EP disclosed
EP-0524419-B1 Heat-sensitive recording materials and phenol compounds MITSUI TOATSU CHEMICALS (JP) 1995-09-06 EP disclosed
US-5391806-A A storage stable chromogens as color-developing agent or stabilizers MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1995-02-21 US disclosed
US-5306688-A Color-forming, electron donating compound and electron accepting compound; storage stability of uncolored portion MITSUI TOATSU CHEMICALS, INC. (JP) 1994-04-26 US disclosed
US-5270281-A Chromogenic compound MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1993-12-14 US disclosed
EP-0534257-A1 Salicylic acid derivatives, the process for preparing the same and the heat-sensitive recording materials comprising thereof MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-03-31 EP disclosed
EP-0524419-A1 Heat-sensitive recording materials and phenol compounds MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-27 EP disclosed