SCHEMBL8965039

SCHEMBL8965039

O=C(/C=C/c1ccc(O)cc1)CC(=O)/C=C/c1ccc(O)c(O)c1O

nearest known ligand 0.70

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
BACE1 P56817 18/20 0.70
AKR1B1 P15121 2/20 0.69
MAOB P27338 2/20 0.69
AKR1B10 O60218 1/20 0.69
PTGS2 P35354 1/20 0.69
GLO1 Q04760 1/20 0.69
CAMK2A Q9UQM7 1/20 0.69
ABCB1 P08183 1/20 0.56
MAOA P21397 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965043 1.00 BACE1 (0.70) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL8965182 0.88 IAPP (0.54) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL8965190 0.88 IAPP (0.54) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL3222897 0.86 BACE1 (0.69) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL3222909 0.86 BACE1 (0.69) BACE1AKR1B1MAOBAKR1B10PTGS2
Bisdemethoxycurcumin SCHEMBL428638 0.83 AKR1B1 (1.00) BACE1AKR1B1MAOBAKR1B10PTGS2
Bisdemethoxycurcumin SCHEMBL2574140 0.83 AKR1B1 (1.00) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL3207773 0.83 BACE1 (1.00) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL3207763 0.83 BACE1 (1.00) BACE1AKR1B1MAOBAKR1B10PTGS2
SCHEMBL3208453 0.83 BACE1 (1.00) BACE1AKR1B1MAOBAKR1B10PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed