SCHEMBL8965190

SCHEMBL8965190

O=C(C=Cc1ccc(O)c(O)c1O)CC(=O)C=Cc1ccc(O)c(O)c1O

nearest known ligand 0.62

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
IAPP P10997 4/20 0.54
MAOB P27338 2/20 0.53
BACE1 P56817 3/20 0.51
APP P05067 2/20 0.47
AKR1B10 O60218 1/20 0.47
AKR1B1 P15121 1/20 0.47
PTGS2 P35354 1/20 0.47
GLO1 Q04760 1/20 0.47
CAMK2A Q9UQM7 1/20 0.47
MAPT P10636 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965182 1.00 IAPP (0.54) IAPPMAOBBACE1APPAKR1B10
SCHEMBL8965043 0.88 BACE1 (0.70) MAOBBACE1AKR1B10AKR1B1PTGS2
SCHEMBL8965039 0.88 BACE1 (0.70) MAOBBACE1AKR1B10AKR1B1PTGS2
SCHEMBL89143 0.82 CA1 (0.57) IAPPMAOBBACE1APPAKR1B10
SCHEMBL89145 0.82 CA1 (0.57) IAPPMAOBBACE1APPAKR1B10
SCHEMBL26046396 0.80 IAPP (0.70) IAPPMAOBAPPMAPT
SCHEMBL17955545 0.79 ALDH1A1 (0.50) IAPPMAOBAPP
SCHEMBL574156 0.78 MAOB (0.47) MAOBMAPT
SCHEMBL8965269 0.74 BACE1 (0.84) BACE1APP
SCHEMBL9246507 0.74 MAOB (0.44) IAPPMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed