SCHEMBL8965104

SCHEMBL8965104

Cc1cc(/C=C/C(=O)CC(=O)/C=C/c2ccc(O)c(C)c2)ccc1O

nearest known ligand 0.88

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BACE1 P56817 6/20 0.88
APP P05067 4/20 0.64
AKR1B1 P15121 3/20 0.64
MAOB P27338 3/20 0.64
MAPT P10636 3/20 0.64
CYP2D6 P10635 2/20 0.64
CYP2C9 P11712 2/20 0.64
TSHR P16473 2/20 0.64
HSD17B10 Q99714 2/20 0.64
TOP2A P11388 2/20 0.64
ABCB1 P08183 2/20 0.64
MAOA P21397 2/20 0.64
PTGS2 P35354 2/20 0.64
GLO1 Q04760 2/20 0.64
CAMK2A Q9UQM7 2/20 0.64
HDAC3 O15379 2/20 0.64
HDAC1 Q13547 2/20 0.64
HDAC2 Q92769 2/20 0.64
HDAC6 Q9UBN7 2/20 0.64
NFE2L2 Q16236 2/20 0.64

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965107 1.00 BACE1 (0.88) BACE1APPAKR1B1MAOBMAPT
SCHEMBL3218761 0.94 BACE1 (1.00) BACE1APPAKR1B1MAOBMAPT
SCHEMBL3218771 0.94 BACE1 (1.00) BACE1APPAKR1B1MAOBMAPT
SCHEMBL12402527 0.89 BACE1 (0.72) BACE1APPAKR1B1MAOBMAPT
SCHEMBL3216545 0.88 APP (0.86) BACE1APPAKR1B1MAOBMAPT
SCHEMBL3216555 0.88 APP (0.86) BACE1APPAKR1B1MAOBMAPT
SCHEMBL10077674 0.87 BACE1 (0.72) BACE1APPAKR1B1MAOBMAPT
SCHEMBL14303722 0.87 BACE1 (0.72) BACE1APPAKR1B1MAOBMAPT
SCHEMBL3215397 0.87 MAPT (0.80) BACE1APPAKR1B1MAOBMAPT
SCHEMBL3215412 0.87 MAPT (0.80) BACE1APPAKR1B1MAOBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2057995-A2 Bioactive compound for cosmetic purposes Evonik Goldschmidt GmbH (DE) 2009-05-13 EP disclosed
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed