SCHEMBL8965197

SCHEMBL8965197

CCCCOc1cc(/C=C/C(=O)CC(=O)/C=C/c2ccc(O)c(OCCCC)c2)ccc1O

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TOP2A P11388 2/20 0.77
▸ APP P05067 10/20 0.68
▸ MAPT P10636 5/20 0.68
▸ BACE1 P56817 4/20 0.68
▸ NFKB1 P19838 3/20 0.68
▸ CYP2D6 P10635 2/20 0.68
▸ CYP2C9 P11712 2/20 0.68
▸ TSHR P16473 2/20 0.68
▸ HSD17B10 Q99714 2/20 0.68
▸ ABCB1 P08183 2/20 0.68
▸ AKR1B1 P15121 2/20 0.68
▸ MAOA P21397 2/20 0.68
▸ MAOB P27338 2/20 0.68
▸ HDAC3 O15379 2/20 0.68
▸ HDAC1 Q13547 2/20 0.68
▸ HDAC2 Q92769 2/20 0.68
▸ HDAC6 Q9UBN7 2/20 0.68
▸ ALOX5 P09917 2/20 0.68
▸ MMP9 P14780 2/20 0.68
▸ STAT3 P40763 2/20 0.68

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965200 1.00 TOP2A (0.77) TOP2AAPPMAPTBACE1NFKB1
SCHEMBL31498024 0.90 APP (0.74) TOP2AAPPMAPTBACE1NFKB1
Ammonia Solution, Strong SCHEMBL28303751 0.90 APP (0.74) TOP2AAPPMAPTBACE1NFKB1
SCHEMBL29123540 0.90 APP (0.74) TOP2AAPPMAPTBACE1NFKB1
SCHEMBL1378809 0.88 APP (0.80) TOP2AAPPMAPTBACE1NFKB1
Ethyl Curcumin SCHEMBL8965258 0.87 TOP2A (1.00) TOP2AAPPMAPTBACE1NFKB1
Ethyl Curcumin SCHEMBL8965263 0.87 TOP2A (1.00) TOP2AAPPMAPTBACE1NFKB1
SCHEMBL30663618 0.86 APP (0.86) TOP2AAPPMAPTBACE1NFKB1
SCHEMBL14157952 0.86 TOP2A (0.68) TOP2AAPPMAPTBACE1NFKB1
SCHEMBL14700139 0.85 MAOB (0.72) TOP2AAPPMAOBCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 — — US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 — — EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 — — US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 — — EP disclosed
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