Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TOP2A | P11388 | 4/20 | 1.00 |
| ▸ | APP | P05067 | 6/20 | 0.73 |
| ▸ | MAPT | P10636 | 3/20 | 0.73 |
| ▸ | BACE1 | P56817 | 3/20 | 0.73 |
| ▸ | NFKB1 | P19838 | 3/20 | 0.73 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.73 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.73 |
| ▸ | TSHR | P16473 | 2/20 | 0.73 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.73 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.73 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.73 |
| ▸ | MAOA | P21397 | 2/20 | 0.73 |
| ▸ | MAOB | P27338 | 2/20 | 0.73 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.73 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.73 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.73 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.73 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.73 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.73 |
| ▸ | MMP9 | P14780 | 2/20 | 0.73 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethyl Curcumin SCHEMBL8965258 | 1.00 | TOP2A (1.00) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL27686673 | 0.94 | TOP2A (0.89) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL29929626 | 0.94 | TOP2A (0.89) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL1374497 | 0.94 | TOP2A (0.89) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL2622443 | 0.93 | TOP2A (0.87) | TOP2AAPPMAPTBACE1NFKB1 | |
| Water SCHEMBL28118110 | 0.93 | TOP2A (0.87) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL27211484 | 0.93 | TOP2A (0.86) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL13953311 | 0.90 | TOP2A (0.81) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL3857596 | 0.89 | TOP2A (0.79) | TOP2AAPPMAPTBACE1NFKB1 | |
| SCHEMBL3857593 | 0.89 | TOP2A (0.79) | TOP2AAPPMAPTBACE1NFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5334481-A | Positive diazo quinone photoresist compositions containing antihalation compound | CIBA-GEIGY CORPORATION (US) | 1994-08-02 | — | — | US | claimed |
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | disclosed |
| EP-0428398-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5399463-A | Process of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizer | CIBA-GEIGY CORPORATION (US) | 1995-03-21 | — | — | US | disclosed |
| US-5334481-A | Positive diazo quinone photoresist compositions containing antihalation compound | CIBA-GEIGY CORPORATION (US) | 1994-08-02 | — | — | US | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0200129-B1 | POSITIVE PHOTORESIST COMPOSITIONS | CIBA-GEIGY AG (CH) | 1992-02-05 | — | — | EP | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |
| EP-0200129-A2 | Positive photoresist compositions | CIBA-GEIGY AG (CH) | 1986-11-05 | — | — | EP | disclosed |