⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15226772 | 0.86 | — | — | |
| SCHEMBL14554018 | 0.86 | — | — | |
| SCHEMBL19674519 | 0.86 | — | — | |
| SCHEMBL15227045 | 0.84 | — | — | |
| SCHEMBL15227649 | 0.81 | — | — | |
| SCHEMBL8466289 | 0.77 | TDP1 (0.34) | — | |
| SCHEMBL896747 | 0.77 | CA1 (0.30) | — | |
| SCHEMBL1155281 | 0.77 | — | — | |
| SCHEMBL19674627 | 0.75 | — | — | |
| SCHEMBL291351 | 0.75 | CTSL (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 263 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170002221-A1 | UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2017-01-05 | — | — | US | claimed |
| US-12036806-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240218244-A1 | CURED FILM AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-12006440-B2 | Radiation curable inkjet inks for interior decoration | AGFA NV (BE) | 2024-06-11 | — | — | US | disclosed |
| US-20240181794-A1 | Ink Jet Method And Ink Jet Apparatus | SEIKO EPSON CORP (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240166791-A1 | CURED FILM AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-05-23 | — | — | US | disclosed |
| US-11981823-B2 | Radiation-curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-14 | — | — | US | disclosed |
| EP-4364950-A1 | ACTINIC RAY-CURABLE INKJET INK COMPOSITION | Sakata INX Corporation (JP) | 2024-05-08 | — | — | EP | disclosed |
| WO-2024084904-A1 | CURABLE COMPOSITION, CURED FILM, AND DISPLAY DEVICE | 住友化学株式会社 | 2024-04-25 | — | — | WO | disclosed |
| US-11952501-B2 | Ink set and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2024-04-09 | — | — | US | disclosed |
| US-20120133060-A1 | RADIATION-CURABLE INK JET COMPOSITION, RECORDING MATTER, AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| CN-101059656-B | Photo-sensitive resin composition containing inorganic particle, photo-sensitive film, and process of forming inorganic pattern | JSR CORP | 2012-05-16 | — | — | CN | disclosed |
| US-20120083545-A1 | ULTRAVIOLET-CURABLE INK JET INK COMPOSITION | SEIKO EPSON CORPORATION | 2012-04-05 | — | — | US | disclosed |
| EP-2348081-A1 | ADHESIVE COMPOSITION AND OPTICAL MEMBER | Cheil Industries Inc. (KR) | 2011-07-27 | — | — | EP | disclosed |
| US-20110009586-A1 | POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE | NIPPON SHOKUBAI CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20080166495-A1 | IMAGE FORMING METHOD AND APPARATUS | FUJIFILM CORPORATION (JP) | 2008-07-10 | — | — | US | disclosed |
| EP-1308434-B1 | (Meth)acryloyl group-containing compound and method for producing the same | NIPPON CATALYTIC CHEM IND (JP) | 2006-03-15 | — | — | EP | disclosed |
| US-6887946-B2 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20030134926-A1 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| EP-1308434-A1 | (Meth)acryloyl group-containing compound and method for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2003-05-07 | — | — | EP | disclosed |