SCHEMBL291351

SCHEMBL291351

C=COCC1CCCCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTSL P07711 1/20 0.35
CTSB P07858 1/20 0.35
CTSK P43235 1/20 0.35
LMNA P02545 1/20 0.35
ADH1B P00325 1/20 0.33
ADH1C P00326 1/20 0.33
ADH1A P07327 1/20 0.33
ADH4 P08319 1/20 0.33
ADH7 P40394 1/20 0.33
SLC1A3 P43003 2/20 0.32
SLC1A2 P43004 2/20 0.32
SLC1A1 P43005 2/20 0.32
CCNA2 P20248 1/20 0.32
CDK2 P24941 1/20 0.32
CCNA1 P78396 1/20 0.32
CHRM5 P08912 2/20 0.31
CYP1A2 P05177 1/20 0.31
ADRA2C P18825 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3244508 1.00 CTSL (0.35) CTSLCTSBCTSKLMNAADH1B
SCHEMBL3238950 1.00 CTSL (0.35) CTSLCTSBCTSKLMNAADH1B
SCHEMBL1155281 0.97
Methyl Alcohol SCHEMBL3138311 0.93 LMNA (0.36) CTSLCTSBCTSKLMNAADH1B
SCHEMBL1155694 0.92
SCHEMBL15227292 0.88
SCHEMBL2579366 0.88 ACHE (0.37) CTSLCTSBCTSKLMNA
SCHEMBL1155328 0.87
SCHEMBL22187599 0.87
SCHEMBL14488382 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12122929-B2 Copolymers of perfluorocycloaliphatic methyl vinyl ether 3M INNOVATIVE PROPERTIES COMPANY (US) 2024-10-22 US claimed
CN-110515270-B Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device 信越化学工业株式会社 2024-07-12 CN claimed
CN-116410374-A Star-branched telechelic polyisobutene, and preparation method and application thereof 北京石油化工学院 2023-07-11 CN claimed
US-11693317-B2 Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US claimed
CN-113056492-B Copolymers of perfluoroalicyclic methyl vinyl ethers 3M创新有限公司 2023-01-06 CN claimed
US-20220033673-A1 COPOLYMERS OF PERFLUOROCYCLOALIPHATIC METHYL VINYL ETHER 3M INNOVATIVE PROPERTIES COMPANY 2022-02-03 US claimed
CN-113056492-A Copolymers of perfluoroalicyclic methyl vinyl ethers 3M创新有限公司 2021-06-29 CN claimed
EP-3137569-B1 ANAEROBIC CURABLE COMPOSITIONS CONTAINING BLOCKED (METH)ACRYLIC ACID COMPOUNDS Henkel IP & Holding GmbH (DE) 2020-04-15 EP claimed
CN-105453306-B Binder for nonaqueous electricity storage element and nonaqueous electricity storage element 协立化学产业株式会社 2018-02-13 CN claimed
EP-2269808-B1 Thermoplastic powder material system for appearance models from 3D printing systems 3D SYSTEMS INCORPORATED (US) 2017-03-22 EP claimed
CN-102164973-B Vinyloxy group-containing vinyl polymer NIPPON CARBIDE KOGYO KK 2013-10-23 CN claimed
US-20130245189-A1 VINYLOZY GROUP-CONTAINING VINYL POLYMER NIPPON CARBIDE INDUSTRIES CO., INC. (JP) 2013-09-19 US claimed
CN-101398624-B Photo acid generator, chemical amplified photoresist combination comprising the same and relative method SAMSUNG ELECTRONICS CO LTD 2012-09-26 CN claimed
CN-102164973-A Vinyloxy group-containing vinyl polymer NIPPON CARBIDE KOGYO KK 2011-08-24 CN claimed
CN-101717361-A Diazo naphthoquinone sulphonate sensitizer containing protecting groups capable of acid decomposition, and synthesis method thereof UNIV BEIJING NORMAL 2010-06-02 CN claimed
CN-101398624-A Photo acid generator, chemical amplified photoresist combination comprising the same and relative method SAMSUNG ELECTRONICS CO LTD (KR) 2009-04-01 CN claimed
EP-1451228-A1 FLUORINE-CONTAINING COMPOUNDS AND POLYMERS DERIVED THEREFROM Honeywell International, Inc. (US) 2004-09-01 EP claimed
US-20030039919-A1 Fluorine-containing compounds and polymers derived therefrom HONEYWELL INTERNATIONAL INC. 2003-02-27 US claimed
WO-2002102858-A1 FLUORINE-CONTAINING COMPOUNDS AND POLYMERS DERIVED THEREFROM HONEYWELL INTERNATIONAL, INC. (US) 2002-12-27 WO claimed
US-5663260-A Hyperbranched copolymers from AB monomers and C monomers CORNELL RESEARCH FOUNDATION, INC. (US) 1997-09-02 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12122929-B2 Copolymers of perfluorocycloaliphatic methyl vinyl ether PFAS, PBRM1, PICALM CTSL 4206/4885CTSB 4437/4885CTSK 4579/4885
US-20220033673-A1 COPOLYMERS OF PERFLUOROCYCLOALIPHATIC METHYL VINYL ETHER PFAS, PBRM1, PICALM CTSL 4206/4885CTSB 4437/4885CTSK 4579/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.