SCHEMBL896812

SCHEMBL896812

CCCOCC(C)OCC(C)OCC(C)OC(C)=O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.59
HSD17B10 Q99714 1/20 0.44
TSHR P16473 3/20 0.40
CHRM2 P08172 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM1 P11229 1/20 0.40
TBXA2R P21731 1/20 0.40
GALR3 O60755 1/20 0.39
MAPT P10636 1/20 0.39
BLM P54132 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
ADRA1D P25100 1/20 0.32
PTAFR P25105 1/20 0.32
HTR1D P28221 1/20 0.32
HTR2C P28335 1/20 0.32
ADRA1B P35368 1/20 0.32
DRD3 P35462 1/20 0.32
TMEM97 Q5BJF2 1/20 0.32
ALDH1A1 P00352 2/20 0.31
PLA2G2C Q5R387 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487418 1.00 TDP1 (0.59) TDP1HSD17B10TSHRCHRM2CHRM4
SCHEMBL105187 0.93 TDP1 (0.52) TDP1HSD17B10TSHRCHRM2CHRM4
Methyl Alcohol SCHEMBL15345249 0.91 TDP1 (0.50) TDP1HSD17B10TSHRCHRM2CHRM4
SCHEMBL895988 0.90 TDP1 (0.47) TDP1TSHRCHRM2CHRM4CHRM1
SCHEMBL487272 0.90 TDP1 (0.47) TDP1TSHRCHRM2CHRM4CHRM1
SCHEMBL15333937 0.90 TDP1 (0.47) TDP1HSD17B10TSHRCHRM2CHRM4
SCHEMBL29243973 0.89 TDP1 (0.49) TDP1HSD17B10TSHRCHRM2CHRM4
SCHEMBL19064961 0.88 TDP1 (0.46) TDP1ADRA1DPTAFRHTR1DHTR2C
SCHEMBL6531007 0.88 TDP1 (0.46) TDP1ADRA1DPTAFRHTR1DHTR2C
SCHEMBL29027169 0.88 TDP1 (0.47) TDP1HSD17B10TSHRCHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250215318-A1 ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT TOKYO OHKA KOGYO CO., LTD. (JP) 2025-07-03 US disclosed
EP-3961676-B1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-01-22 EP disclosed
US-12187047-B2 Flow passage member, liquid ejecting head, liquid ejecting apparatus, and method for manufacturing flow passage member SEIKO EPSON CORPORATION (JP) 2025-01-07 US disclosed
CN-119278503-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
CN-119278504-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
US-11945152-B2 Model material ink set, support material composition, ink set, three-dimensional shaped object, and method for manufacturing three-dimensional shaped object MAXELL, LTD. (JP) 2024-04-02 US disclosed
EP-3715094-B1 COMPOSITION FOR MODEL MATERIAL MAXELL LTD (JP) 2024-03-27 EP disclosed
CN-108026225-B Resin composition for mold material, resin composition for support material, stereolithography product, and method for producing stereolithography product 麦克赛尔株式会社 2024-03-05 CN disclosed
CN-117304414-A Resin composition for mold material and stereolithography 麦克赛尔株式会社 2023-12-29 CN disclosed
WO-2023204141-A1 ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT 東京応化工業株式会社 2023-10-26 WO disclosed
US-9498959-B2 Maintenance unit and liquid ejection device SEIKO EPSON CORPORATION (JP) 2016-11-22 US disclosed
US-20160263899-A1 INK JET RECORDING APPARATUS AND METHOD FOR MAINTAINING THE SAME SEIKO EPSON CORPORATION (JP) 2016-09-15 US disclosed
US-9409398-B2 Maintenance unit and liquid ejecting apparatus SEIKO EPSON CORPORATION (JP) 2016-08-09 US disclosed
US-20160144626-A1 MAINTENANCE UNIT AND LIQUID EJECTING APPARATUS SEIKO EPSON CORPORATION (JP) 2016-05-26 US disclosed
US-20160121614-A1 MAINTENANCE UNIT AND LIQUID EJECTION DEVICE SEIKO EPSON CORPORATION (JP) 2016-05-05 US disclosed
US-9199469-B1 Ink jet recording apparatus and maintenance thereof SEIKO EPSON CORPORATION (JP) 2015-12-01 US disclosed
US-20150328897-A1 INK JET RECORDING APPARATUS AND MAINTENANCE THEREOF SEIKO EPSON CORPORATION (JP) 2015-11-19 US disclosed
EP-2944472-A1 INK JET RECORDING APPARATUS AND MAINTENANCE METHOD THEREOF Seiko Epson Corporation (JP) 2015-11-18 EP disclosed
US-20120082791-A1 Coating Composition Amenable to Elastomeric Substrates LIVERSAGE ROBERT RICHARD (US) 2012-04-05 US disclosed
US-20090026425-A1 COMPOSITION COMPRISING POLYESTER AMIDE ACID AND THE LIKE AND INK-JET INK COMPOSITION USING THE SAME CHISSO CORPORATION (JP) 2009-01-29 US disclosed