Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.45 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.45 |
| ▸ | GALR3 | O60755 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.34 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.34 |
| ▸ | PTAFR | P25105 | 1/20 | 0.34 |
| ▸ | HTR1D | P28221 | 1/20 | 0.34 |
| ▸ | HTR2C | P28335 | 1/20 | 0.34 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.34 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL15345249 | 0.98 | TDP1 (0.50) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| SCHEMBL15259597 | 0.93 | TDP1 (0.46) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| SCHEMBL487418 | 0.93 | TDP1 (0.59) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| SCHEMBL896812 | 0.93 | TDP1 (0.59) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| Propylene Glycol SCHEMBL154787 | 0.89 | TDP1 (0.51) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| SCHEMBL21357986 | 0.89 | ALDH1A1 (0.48) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| SCHEMBL15333361 | 0.89 | TDP1 (0.43) | TDP1HSD17B10TSHRCHRM2CHRM4 | |
| SCHEMBL107643 | 0.88 | ALDH1A1 (0.47) | TDP1TSHRCHRM2CHRM4CHRM1 | |
| SCHEMBL2230535 | 0.86 | PLA2G2C (0.49) | PLA2G2CADRA1DPTAFRHTR1DHTR2C | |
| Water SCHEMBL27447449 | 0.86 | ALDH1A1 (0.45) | TDP1TSHRCHRM2CHRM4CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 10976 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-122095033-A | Formulations | — | 2026-05-26 | — | — | CN | claimed |
| WO-2026104328-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2026-05-21 | — | — | WO | claimed |
| CN-122037616-A | Pigment red 254 kneading inducer and application thereof | 重庆安尚科技有限公司 | 2026-05-15 | — | — | CN | claimed |
| EP-4720077-A1 | ORGANOMETALLIC TIN OXO CARBOXYLATE CLUSTERS WITH MIXED ORGANIC LIGANDS FOR EUV LITHOGRAPHY | Merck Patent GmbH (DE) | 2026-04-08 | — | — | EP | claimed |
| EP-4072992-B1 | COMPOSITION | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-04-08 | — | — | EP | claimed |
| CN-121578590-A | Composition for forming lower layer film of patterning material and lower layer film of patterning material | 珠海基石科技有限公司 | 2026-02-27 | — | — | CN | claimed |
| US-20260016747-A1 | RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-01-15 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| US-12393122-B2 | Thinner composition and method of processing surfaces of semiconductor substrates | SK Hynix Inc. (KR) | 2025-08-19 | — | — | US | claimed |
| WO-2003083126-A2 | ENZYMATIC RESOLUTION OF PROPYLENE GLYCOL ALKYL (OR ARYL) ETHERS AND ETHER ACETATES | DOW GLOBAL TECHNOLOGIES INC. (US) | 2003-10-09 | — | — | WO | claimed |
| WO-2003083032-A1 | THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-10-09 | — | — | WO | claimed |
| EP-1336609-A2 | Recovery of 3,4-epoxy-1-butene by extractive distillation | EASTMAN CHEMICAL COMPANY (US) | 2003-08-20 | — | — | EP | claimed |
| US-6582565-B1 | Recovery of 3,4-epoxy-1-butene by extractive distillation | EASTMAN CHEMICAL COMPANY | 2003-06-24 | — | — | US | claimed |
| US-20020132123-A1 | Thermosetting anti-reflective coatings for full-fill dual damascene process | BREWER SCIENCE, INC. | 2002-09-19 | — | — | US | claimed |
| US-6444320-B1 | CAN BE USED TO PROTECT CONTACT OR VIA HOLES FROM DEGRADATION DURING SUBSEQUENT ETCHING IN THE DUAL DAMASCENE | BREWER SCIENCE | 2002-09-03 | — | — | US | claimed |
| US-6395450-B1 | MIXTURE OF ACID GENERATOR, BINDER AND SOLVENT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-05-28 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | claimed |
| US-5422221-A | Hydrogen atoms of hydroxyl groups in novolac resin replaced by 1,2-naphthoquinonediazidosulfonyl group; sensitiivity, resolution, heat resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-06-06 | — | — | US | claimed |