Acetic Acid Phenyl Ester

Acetic Acid Phenyl Ester

SCHEMBL896830

C=CC.C=CC.CC(=O)Oc1ccccc1.CCOCC.OCCO

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.46
MAPT P10636 3/20 0.44
GAA P10253 2/20 0.44
ALDH1A1 P00352 1/20 0.44
HSP90AA1 P07900 1/20 0.44
ACHE P22303 1/20 0.44
BACE1 P56817 1/20 0.42
KMT2A Q03164 3/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
TDP1 Q9NUW8 1/20 0.40
LMNA P02545 2/20 0.40
CYP3A4 P08684 1/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
POLB P06746 1/20 0.39
HSD17B10 Q99714 2/20 0.38
TSHR P16473 1/20 0.38
HTT P42858 1/20 0.38
PTGS2 P35354 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid Phenyl Ester SCHEMBL896889 0.92 ELANE (0.53) ELANEMAPTGAAALDH1A1HSP90AA1
Acetic Acid Phenyl Ester SCHEMBL1830444 0.87 ELANE (0.58) ELANEMAPTGAAALDH1A1HSP90AA1
Ether SCHEMBL6560461 0.87 ELANE (0.51) ELANEMAPTALDH1A1ACHEKMT2A
Ether SCHEMBL12971186 0.85 MAPT (0.47) MAPTGAAALDH1A1HSP90AA1KMT2A
Acetic Acid Phenyl Ester SCHEMBL1756179 0.85 ELANE (0.60) ELANEMAPTGAAALDH1A1HSP90AA1
Ether SCHEMBL12971074 0.85 KMT2A (0.40) ELANEMAPTALDH1A1KMT2ALMNA
Ether SCHEMBL37233 0.84 THRB (0.51) ELANEMAPTALDH1A1KMT2ALMNA
Acetic Acid Phenyl Ester SCHEMBL140659 0.84 ELANE (0.49) ELANEMAPTGAAALDH1A1HSP90AA1
Acetic Acid Phenyl Ester SCHEMBL4908257 0.84 ELANE (0.58) ELANEMAPTGAAALDH1A1HSP90AA1
Acetic Acid Phenyl Ester SCHEMBL2687129 0.83 ELANE (0.62) ELANEMAPTGAAALDH1A1HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116013577-B Preparation method of high-temperature sintering conductive paste 长春黄金研究院有限公司 2023-06-23 CN claimed
CN-116013577-A Preparation method of high-temperature sintering conductive paste 长春黄金研究院有限公司 2023-04-25 CN claimed
CN-113631595-B Polymer composition and use thereof 罗地亚经营管理公司 2023-04-11 CN claimed
US-11535739-B2 Polymer compositions having fast hydration rate and use of the same for particle suspension RHODIA OPERATIONS INC. (FR) 2022-12-27 US claimed
CN-112133469-B Mixed organic solvent for preparing high-temperature sintering conductive slurry 长春黄金研究院有限公司 2022-03-11 CN claimed
CN-113874411-A Structure of associative polymers and method of use thereof 罗地亚经营管理公司 2021-12-31 CN claimed
CN-113631595-A Polymer composition and use thereof 罗地亚经营管理公司 2021-11-09 CN claimed
CN-112133469-A Mixed organic solvent for preparing high-temperature sintering conductive slurry 长春黄金研究院有限公司 2020-12-25 CN claimed
US-20200392271-A1 ASSOCIATIVE POLYMER STRUCTURES AND METHODS OF USE THEREOF RHODIA OPERATIONS (FR) 2020-12-17 US claimed
WO-2020236437-A1 ASSOCIATIVE POLYMER STRUCTURES AND METHODS OF USE THEREOF RHODIA OPERATIONS (FR) 2020-11-26 WO claimed
WO-2020190622-A1 POLYMER COMPOSITIONS AND USE OF THE SAME RHODIA OPERATIONS (FR) 2020-09-24 WO claimed
US-20200291221-A1 POLYMER COMPOSITIONS AND USE OF THE SAME RHODIA OPERATIONS (FR) 2020-09-17 US claimed
US-20170218162-A1 RECYCLING PROCESS WORN AGAIN TECHNOLOGIES LIMITED (GB) 2017-08-03 US claimed
EP-3172267-A1 RECYCLING PROCESS Worn Again Footwear And Accessories Limited (GB) 2017-05-31 EP claimed
WO-2016012755-A1 RECYCLING PROCESS WORN AGAIN FOOTWEAR AND ACCESSORIES LIMITED (GB) 2016-01-28 WO claimed
US-20250215318-A1 ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT TOKYO OHKA KOGYO CO., LTD. (JP) 2025-07-03 US disclosed
EP-3961676-B1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-01-22 EP disclosed
EP-0735403-B1 Liquid crystal orienting agent JSR CORP (JP) 2004-03-17 EP disclosed
US-5700860-A Liquid crystal orienting agent JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-12-23 US disclosed
EP-0735403-A1 Liquid crystal orienting agent JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-10-02 EP disclosed