SCHEMBL8968927

SCHEMBL8968927

CC1(C)C2CCC1(CS(=O)(=O)ON1C(=O)c3cccc4cc([N+](=O)[O-])cc(c34)C1=O)C(=O)C2

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FTO Q9C0B1 2/20 0.45
PABPC1 P11940 2/20 0.45
CA1 P00915 5/20 0.44
CA2 P00918 5/20 0.44
CA12 O43570 3/20 0.44
CA9 Q16790 3/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
POLB P06746 2/20 0.44
KDM4E B2RXH2 1/20 0.44
MAPT P10636 1/20 0.44
S1PR1 P21453 1/20 0.44
HTT P42858 1/20 0.44
RAD52 P43351 1/20 0.44
RECQL P46063 1/20 0.44
RAB9A P51151 1/20 0.44
PAX8 Q06710 1/20 0.44
NTRK1 P04629 1/20 0.43
NGFR P08138 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4545352 0.89 KMT2A (0.50) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL18962226 0.89 KMT2A (0.50) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL19985741 0.84 SMN1; SMN2 (0.42) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL13829109 0.83 KMT2A (0.41) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL452144 0.83 KMT2A (0.56) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL15617809 0.82 CXCR3 (0.41) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL13829259 0.81 KMT2A (0.41) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL13829263 0.81 KMT2A (0.40) CA1CA2MEN1KMT2ASMN1; SMN2
SCHEMBL13829194 0.81 CXCR3 (0.41) CA1CA2MEN1KMT2AKDM4E
SCHEMBL13829134 0.81 KMT2A (0.40) CA1CA2MEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0698230-A1 CHEMICALLY AMPLIFIED PHOTORESIST International Business Machines Corporation (US) 1996-02-28 EP disclosed
EP-0698230-A4 CHEMICALLY AMPLIFIED PHOTORESIST IBM (US) 1995-10-24 EP disclosed
WO-1994010608-A9 CHEMICALLY AMPLIFIED PHOTORESIST 1994-07-21 WO disclosed
WO-1994010608-A1 CHEMICALLY AMPLIFIED PHOTORESIST INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-05-11 WO disclosed