Phosphoric Acid

Phosphoric Acid

SCHEMBL896928

O=P(O)(O)O.O[Si](O)(O)O.[Zr]

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.39
SLC34A1 Q06495 1/20 0.36
KDM4E B2RXH2 1/20 0.33
MMP2 P08253 1/20 0.33
THRB P10828 1/20 0.33
MAPK1 P28482 1/20 0.33
HSD17B10 Q99714 1/20 0.33
FDPS P14324 1/20 0.33
BLM P54132 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphoric Acid SCHEMBL17748184 0.95 CA2 (0.36) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL8108786 0.95 CA2 (0.36) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL19209894 0.95 CA2 (0.36) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL29230322 0.95 CA2 (0.36) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL22396378 0.95 CA2 (0.36) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL8506806 0.95 CA2 (0.42) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL217622 0.95 CA2 (0.42) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL28724551 0.91 CA2 (0.33) CA2SLC34A1
Phosphoric Acid SCHEMBL23272305 0.90 CA2 (0.39) CA2SLC34A1KDM4EMMP2THRB
Phosphoric Acid SCHEMBL6889563 0.90 CA2 (0.39) CA2SLC34A1KDM4EMMP2THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0014105-B1 FLAVOURANT COMPOSITION FOR TOBACCO, METHOD FOR ITS PRODUCTION AND TOBACCO PRODUCT CONTAINING SAID COMPOSITION THE JAPAN TOBACCO & SALT PUBLIC CORPORATION (JP) 1984-05-02 EP claimed
EP-0014105-A2 Flavourant composition for tobacco, method for its production and tobacco product containing said composition THE JAPAN TOBACCO & SALT PUBLIC CORPORATION (JP) 1980-08-06 EP claimed
JP-62004222-A None JP disclosed
JP-62045578-A None JP disclosed
CN-117779232-A Fiber composition and method for producing same 旭化成株式会社 2024-03-29 CN disclosed
EP-4260395-A1 ELECTROCHEMICAL CELL, AND BATTERY ASSEMBLY Lina Energy Ltd. (GB) 2023-10-18 EP disclosed
WO-2022190745-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ADHESIVE 株式会社ADEKA 2022-09-15 WO disclosed
WO-2022123246-A1 ELECTROCHEMICAL CELL, AND BATTERY ASSEMBLY LINA ENERGY LTD. (GB) 2022-06-16 WO disclosed
US-8389198-B2 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate FUJIFILM CORPORATION (JP) 2013-03-05 US disclosed
US-8361702-B2 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate FUJIFILM CORPORATION (JP) 2013-01-29 US disclosed
US-20120240798-A1 RESIN COMPOSITION FOR LASER ENGRAVING, FLEXO PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXO PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2012-09-27 US disclosed
EP-2047987-A2 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate FUJIFILM Corporation (JP) 2009-04-15 EP disclosed
US-20090081414-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RESIN PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD FOR PRODUCTION OF RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-03-26 US disclosed
US-5290932-A Reaction of heterocyclic secondary amine with ketone BASF AKTIENGESELLSCHAFT (DE) 1994-03-01 US disclosed
US-5173518-A Containing polyoxytetramethylene glycol radicals and chain extender or crosslinking agent BASF AKTIENGESELLSCHAFT (DE) 1992-12-22 US disclosed
JP-S6245578-A PRODUCTION OF ISOCYANURATE RES INST FOR PROD DEV 1987-02-27 JP disclosed
JP-S624222-A FRAGRANT MATERIAL KOUKANDOU:KK 1987-01-10 JP disclosed
EP-0014105-B1 FLAVOURANT COMPOSITION FOR TOBACCO, METHOD FOR ITS PRODUCTION AND TOBACCO PRODUCT CONTAINING SAID COMPOSITION THE JAPAN TOBACCO & SALT PUBLIC CORPORATION (JP) 1984-05-02 EP disclosed
US-4318417-A Flavorant composition for tobacco, method for producing the same tobacco product comprising said composition THE JAPAN TOBACCO & SALT PUBLIC CORPORATION (JP) 1982-03-09 US disclosed
EP-0014105-A2 Flavourant composition for tobacco, method for its production and tobacco product containing said composition THE JAPAN TOBACCO & SALT PUBLIC CORPORATION (JP) 1980-08-06 EP disclosed