SCHEMBL8972079

SCHEMBL8972079

Cc1ccc(-c2c3ccccc3nc3ccccc23)cc1C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.51
ESR1 P03372 2/20 0.51
ESR2 Q92731 2/20 0.51
NQO2 P16083 1/20 0.50
CYP1A2 P05177 1/20 0.48
BACE1 P56817 1/20 0.46
POLB P06746 2/20 0.45
TP53 P04637 2/20 0.44
KDM4E B2RXH2 4/20 0.44
ALDH1A1 P00352 4/20 0.44
ADORA2A P29274 1/20 0.44
RAB9A P51151 2/20 0.43
KMT2A Q03164 2/20 0.43
TAAR1 Q96RJ0 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
MAPT P10636 3/20 0.43
LMNA P02545 3/20 0.43
HPGD P15428 2/20 0.43
RECQL P46063 1/20 0.43
MEN1 O00255 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29660572 1.00 NPC1 (0.51) NPC1ESR1ESR2NQO2CYP1A2
SCHEMBL601228 0.79 TDP1 (0.57) NPC1ESR1ESR2NQO2CYP1A2
SCHEMBL29446758 0.79 TDP1 (0.57) NPC1ESR1ESR2NQO2CYP1A2
SCHEMBL29446786 0.78 KMT2A (0.56) NPC1ESR1ESR2NQO2TP53
SCHEMBL602106 0.78 KMT2A (0.56) NPC1ESR1ESR2NQO2TP53
SCHEMBL13382357 0.78 ESR1 (0.64) ESR1ESR2NQO2CYP1A2POLB
SCHEMBL28193791 0.77 ESR1 (0.55) NPC1ESR1ESR2NQO2CYP1A2
SCHEMBL13651520 0.76 ESR1 (0.46) ESR1ESR2NQO2CYP1A2BACE1
SCHEMBL1103403 0.76 NPC1 (0.47) NPC1ESR1ESR2CYP1A2KDM4E
SCHEMBL1103265 0.76 NPC1 (0.50) NPC1KDM4EALDH1A1RAB9AKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1403710-B1 Polymerizable composition FUJIFILM CORP (JP) 2015-06-10 EP disclosed
EP-0949540-B1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJIFILM CORP (JP) 2012-05-02 EP disclosed
US-20100003618-A1 POLYMER HAVING POLYMERIZABLE GROUP, POLYMERIZABLE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND PLANOGRAPHIC PRINTING METHOD USING THE SAME KUNITA KAZUTO 2010-01-07 US disclosed
US-20100003618-A1 POLYMER HAVING POLYMERIZABLE GROUP, POLYMERIZABLE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND PLANOGRAPHIC PRINTING METHOD USING THE SAME KUNITA KAZUTO 2010-01-07 US disclosed
US-7618762-B2 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same FUJIFILM CORPORATION (JP) 2009-11-17 US disclosed
US-7618762-B2 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same FUJIFILM CORPORATION (JP) 2009-11-17 US disclosed
US-7569328-B2 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION (JP) 2009-08-04 US disclosed
US-7569328-B2 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION (JP) 2009-08-04 US disclosed
EP-1344783-B1 Process for producing polymer compounds by elimination reaction FUJIFILM CORP (JP) 2009-05-13 EP disclosed
US-7455954-B2 Lithographic printing plate precursor and polymerizable composition FUJIFILM CORPORATION (JP) 2008-11-25 US disclosed
US-20080044763-A1 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION 2008-02-21 US disclosed
US-20080044763-A1 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION 2008-02-21 US disclosed
US-7232644-B2 Polymerizable composition and negative-working planographic printing plate precursor using the same FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-7232644-B2 Polymerizable composition and negative-working planographic printing plate precursor using the same FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
EP-0374704-B1 Photopolymerisable blend and photopolymerisable recording material containing it MORTON INT INC (US) 1996-03-27 EP disclosed
US-5233038-A PHOTOCHRONIC COMPOUNDS OF THE INDOLINO-SPIRO-BENZOXAZINE TYPE ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 1993-08-03 US disclosed
US-5217845-A 9-Arylacridine as photoinitiator HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-08 US disclosed
EP-0374704-A2 Photopolymerisable blend and photopolymerisable recording material containing it MORTON INTERNATIONAL, INC. (US) 1990-06-27 EP disclosed