Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 5/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.57 |
| ▸ | MAPT | P10636 | 3/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | LSS | P48449 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
| ▸ | ESR1 | P03372 | 1/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.38 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21082729 | 0.93 | L3MBTL1 (0.66) | HPGDALDH1A1MAPTL3MBTL1NPC1 | |
| SCHEMBL21082727 | 0.91 | L3MBTL1 (0.49) | HPGDALDH1A1MAPTL3MBTL1NPC1 | |
| SCHEMBL21082730 | 0.91 | L3MBTL1 (0.49) | HPGDALDH1A1MAPTL3MBTL1NPC1 | |
| SCHEMBL11354165 | 0.89 | HPGD (0.53) | HPGDALDH1A1MAPTL3MBTL1NPC1 | |
| SCHEMBL1663690 | 0.86 | L3MBTL1 (0.58) | HPGDALDH1A1MAPTL3MBTL1NPC1 | |
| SCHEMBL1665050 | 0.86 | RAB9A (0.53) | ALDH1A1MAPTL3MBTL1NPC1RAB9A | |
| SCHEMBL16016477 | 0.85 | L3MBTL1 (0.53) | HPGDALDH1A1MAPTL3MBTL1MEN1 | |
| SCHEMBL11571924 | 0.83 | HPGD (0.47) | HPGDALDH1A1MAPTL3MBTL1NPC1 | |
| SCHEMBL10154271 | 0.82 | L3MBTL1 (0.50) | HPGDL3MBTL1HTTSMN1; SMN2TNIK | |
| SCHEMBL10906239 | 0.81 | HPGD (0.53) | HPGDALDH1A1MAPTL3MBTL1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109232281-B | Preparation method of 4,4' -bis [ (2-hydroxyethyl) methylamino ] benzophenone | 杭州盛弗泰新材料科技有限公司 | 2021-10-26 | — | — | CN | claimed |
| US-11079635-B2 | Sealant and method for fabricating the same, and display device | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2021-08-03 | — | — | US | claimed |
| CN-109232281-A | A kind of preparation method of 4,4 '-two [(2- hydroxyethyl) methylamino] benzophenone | 杭州盛弗泰新材料科技有限公司 | 2019-01-18 | — | — | CN | claimed |
| CN-109232281-B | Preparation method of 4,4' -bis [ (2-hydroxyethyl) methylamino ] benzophenone | 杭州盛弗泰新材料科技有限公司 | 2021-10-26 | — | — | CN | disclosed |
| CN-109232281-B | Preparation method of 4,4' -bis [ (2-hydroxyethyl) methylamino ] benzophenone | 杭州盛弗泰新材料科技有限公司 | 2021-10-26 | — | — | CN | disclosed |
| CN-109232281-B | Preparation method of 4,4' -bis [ (2-hydroxyethyl) methylamino ] benzophenone | 杭州盛弗泰新材料科技有限公司 | 2021-10-26 | — | — | CN | disclosed |
| US-11079635-B2 | Sealant and method for fabricating the same, and display device | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2021-08-03 | — | — | US | disclosed |
| US-20190204637-A1 | SEALANT AND METHOD FOR FABRICATING THE SAME, AND DISPLAY DEVICE | HEFEI BOE DISPLAY TECHNOLOGY CO., LTD. (CN) | 2019-07-04 | — | — | US | disclosed |
| EP-0422488-B1 | Photopolymerisable mixtures and photosensitive recording elements containing such mixtures | BASF AG (DE) | 1996-04-03 | — | — | EP | disclosed |
| EP-0291881-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-12-23 | — | — | EP | disclosed |
| EP-0251049-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS AND LITHOGRAPHIC PRINTING PLATES BASED ON THESE REGISTRATION MATERIALS | BASF Aktiengesellschaft (DE) | 1992-09-09 | — | — | EP | disclosed |
| US-4550072-A | Photosensitive recording materials containing particles for the production of abrasion-resistant gravure printing plates, and the production of gravure printing plates using these recording materials | BASF AKTIENGESELLSCHAFT (DE) | 1985-10-29 | — | — | US | disclosed |
| US-4548894-A | Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles | BASF AKTIENGESELLSCHAFT (DE) | 1985-10-22 | — | — | US | disclosed |
| EP-0055807-B1 | MULTILAYER ELEMENTS FOR THE MANUFACTURE OF PRINTING PLATES AND RELIEF FORMS | BASF Aktiengesellschaft (DE) | 1985-03-06 | — | — | EP | disclosed |
| US-4459348-A | Multi-layer elements suitable for the production of printing plates and relief plates | BASF AKTIENGESELLSCHAFT (DE) | 1984-07-10 | — | — | US | disclosed |
| US-4401749-A | Multi-layer elements suitable for the production of printing plates and relief plates, and their production | BASF AKTIENGESELLSCHAFT (DE) | 1983-08-30 | — | — | US | disclosed |
| EP-0055807-A2 | Multilayer elements for the manufacture of printing plates and relief forms | BASF Aktiengesellschaft (DE) | 1982-07-14 | — | — | EP | disclosed |
| EP-0000342-B1 | PHOTOPOLYMERISABLE BINDERS | BASF Aktiengesellschaft (DE) | 1981-11-25 | — | — | EP | disclosed |
| US-4147604-A | PRINTING INKS, COATINGS, PRINTING PLATES | BASF AKTIENGESELLSCHAFT (DE) | 1979-04-03 | — | — | US | disclosed |
| EP-0000342-A1 | Photopolymerisable binders | BASF Aktiengesellschaft (DE) | 1979-01-24 | — | — | EP | disclosed |