SCHEMBL897604

SCHEMBL897604

CCc1cc2ccccc2c(C(=O)O)c1C(=O)O

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.63
KMT2A Q03164 4/20 0.63
KDM4E B2RXH2 2/20 0.63
ALDH1A1 P00352 1/20 0.63
CYP1A2 P05177 1/20 0.63
GLA P06280 1/20 0.63
HPGD P15428 1/20 0.63
CYP2C19 P33261 1/20 0.63
HSD17B10 Q99714 1/20 0.63
ME2 P23368 1/20 0.52
ME1 P48163 1/20 0.52
ME3 Q16798 1/20 0.52
GPR35 Q9HC97 2/20 0.42
POLB P06746 1/20 0.42
CDC25B P30305 2/20 0.41
RXFP1 Q9HBX9 2/20 0.41
PDE10A Q9Y233 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
P2RX3 P56373 1/20 0.40
NPC1 O15118 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12972497 0.88 ME2 (0.62) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL313151 0.87 MEN1 (0.66) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL1079661 0.86 MEN1 (0.59) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL15111819 0.85 HSD17B10 (0.53) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL9250273 0.84 MEN1 (0.61) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL6536195 0.83 KDM4E (0.51) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL5575880 0.83 BID (0.54) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL7184877 0.83 BID (0.54) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL28751492 0.83 MEN1 (0.59) MEN1KMT2AKDM4EALDH1A1CYP1A2
SCHEMBL11030727 0.82 KDM4E (0.50) MEN1KMT2AKDM4EALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8043993-A None JP disclosed
CN-118076472-A 3D printing material with color and/or reflectance control 昕诺飞控股有限公司 2024-05-24 CN disclosed
CN-116529054-A Light reflecting surface made of FFF 昕诺飞控股有限公司 2023-08-01 CN disclosed
EP-2471079-B1 EXTERNALLY FUSED AND RESISTIVELY LOADED SAFE CAPACITOR KEMET ELECTRONICS CORP (US) 2016-01-06 EP disclosed
US-8904609-B2 Externally fused and resistively loaded safety capacitor KEMET ELECTRONICS CORPORATION (US) 2014-12-09 US disclosed
US-8470633-B2 Circuit architecture on an organic base and related manufacturing method STMICROELECTRONICS S.R.L. (IT) 2013-06-25 US disclosed
US-8264816-B2 Externally fused and resistively loaded safety capacitor KEMET ELECTRONICS CORPORATION (US) 2012-09-11 US disclosed
EP-2471079-A2 EXTERNALLY FUSED AND RESISTIVELY LOADED SAFETY CAPACITOR Kemet Electronics Corporation (US) 2012-07-04 EP disclosed
US-20120079693-A1 EXTERNALLY FUSED AND RESISTIVELY LOADED SAFETY CAPACITOR KEMET ELECTRONICS CORPORATION (US) 2012-04-05 US disclosed
US-20110275018-A1 CIRCUIT ARCHITECTURE ON AN ORGANIC BASE AND RELATED MANUFACTURING METHOD STMICROELECTRONICS S.R.L. (IT) 2011-11-10 US disclosed
EP-1094050-B1 Process for the preparation of 2,6-dimethylnaphthalene POLIMERI EUROPA SPA (IT) 2004-02-25 EP disclosed
US-20030144564-A1 Process for the preparation of 2,6-dimethylnaphthalene ENICHEM S.P.A. (IT) 2003-07-31 US disclosed
US-20020008113-A1 THERMALLY INSULATED SYNTHETIC RESIN CONTAINER AND THERMALLY INSULATED SYNTHETIC RESIN LID NIPPON SANSO CORPORATION (JP) 2002-01-24 US disclosed
US-6232517-B1 SUBJECTING 1,6 AND/OR 1,5-DIMETHYLNAPHTHALENES, OPTIONALLY WITH OTHER ISOMERS, TO ISOMERIZATION, COMPRISING TREATING SAID COMPOUNDS AT ELEVATED TEMPERATURE, UNDER AT LEAST PARTIALLY LIQUID PHASE CONDITIONS, IN PRESENCE OF MTW ZEOLITE ENICHEM S.P.A. (IT) 2001-05-15 US disclosed
EP-1094050-A2 Process for the preparation of 2,6-dimethylnaphthalene Enichem S.p.A. (IT) 2001-04-25 EP disclosed
US-6147270-A REACTING NAPHTHALENE HYDROCARBON WITH ONE OR MORE BENZENE HYDROCARBONS UNDER AT LEAST PARTIALLY LIQUID PHASE CONDITIONS, IN PRESENCE OF ZEOLITE HAVING MTW STRUCTURE WHICH HAS CATION ION SITES AND OPTIONALLY IN PRESENCE OF METHYLATING AGENT ENICHEM S.P.A. (IT) 2000-11-14 US disclosed
EP-0950650-A2 Process for the preparation of 2,6 dimethylnaphthalene Enichem S.p.A. (IT) 1999-10-20 EP disclosed
US-5876549-A Method and apparatus for stacking sheets supported by carriers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-03-02 US disclosed
US-5783026-A Apparatus for stacking sheets by carriers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-07-21 US disclosed
JP-H0843993-A SUPPORT FOR PHOTOGRAPH FUJI PHOTO FILM CO LTD 1996-02-16 JP disclosed