SCHEMBL8977023

SCHEMBL8977023

COc1ccc(C(=O)C=Cc2ccc(O)c([N+](=O)[O-])c2)cc1OC

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.69
ALDH1A1 P00352 3/20 0.69
HPGD P15428 1/20 0.69
ABCG2 Q9UNQ0 5/20 0.68
PDE4A P27815 1/20 0.68
PDE4B Q07343 1/20 0.68
PDE4C Q08493 1/20 0.68
PDE4D Q08499 1/20 0.68
MEN1 O00255 4/20 0.65
KMT2A Q03164 4/20 0.65
POLB P06746 1/20 0.65
MAPT P10636 4/20 0.62
NPSR1 Q6W5P4 3/20 0.62
DPP4 P27487 1/20 0.62
PREP P48147 1/20 0.62
DPP9 Q86TI2 1/20 0.62
ABCB1 P08183 1/20 0.62
HTT P42858 2/20 0.61
MAPK1 P28482 1/20 0.61
SMN1; SMN2 Q16637 1/20 0.61

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8977014 1.00 LMNA (0.69) LMNAALDH1A1HPGDABCG2PDE4A
SCHEMBL8965003 0.95 LMNA (0.72) LMNAALDH1A1HPGDABCG2PDE4A
SCHEMBL8965000 0.95 LMNA (0.72) LMNAALDH1A1HPGDABCG2PDE4A
SCHEMBL8848307 0.87 DBH (0.78) LMNAALDH1A1HPGDABCG2PDE4A
SCHEMBL8848314 0.87 DBH (0.78) LMNAALDH1A1HPGDABCG2PDE4A
SCHEMBL25235120 0.86 MAPT (0.72) LMNAALDH1A1HPGDMEN1KMT2A
SCHEMBL25200295 0.86 MAPT (0.72) LMNAALDH1A1HPGDMEN1KMT2A
SCHEMBL28263082 0.84 PDE4A (0.90) LMNAABCG2PDE4APDE4BPDE4C
SCHEMBL15807747 0.83 KRAS (0.77) LMNAALDH1A1ABCG2MEN1KMT2A
SCHEMBL2458577 0.82 ABCG2 (1.00) LMNAABCG2PDE4APDE4BPDE4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP claimed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP claimed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed