SCHEMBL8965003

SCHEMBL8965003

COc1ccc(/C=C/C(=O)c2ccc(O)c([N+](=O)[O-])c2)cc1OC

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.72
ALDH1A1 P00352 2/20 0.72
HPGD P15428 1/20 0.72
PDE4A P27815 3/20 0.72
PDE4B Q07343 3/20 0.72
PDE4C Q08493 3/20 0.72
PDE4D Q08499 3/20 0.72
ABCG2 Q9UNQ0 3/20 0.68
MEN1 O00255 2/20 0.66
KMT2A Q03164 2/20 0.66
MAPT P10636 2/20 0.65
GAA P10253 1/20 0.65
HTT P42858 1/20 0.65
DPP4 P27487 1/20 0.65
PREP P48147 1/20 0.65
DPP9 Q86TI2 1/20 0.65
POLB P06746 1/20 0.61
TNFRSF1A P19438 1/20 0.60
NR1H4 Q96RI1 1/20 0.60
NPSR1 Q6W5P4 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965000 1.00 LMNA (0.72) LMNAALDH1A1HPGDPDE4APDE4B
SCHEMBL8977023 0.95 LMNA (0.69) LMNAALDH1A1HPGDPDE4APDE4B
SCHEMBL8977014 0.95 LMNA (0.69) LMNAALDH1A1HPGDPDE4APDE4B
SCHEMBL8965404 0.85 ABCG2 (0.64) LMNAALDH1A1HPGDPDE4APDE4B
SCHEMBL28261930 0.84 PDE4A (1.00) PDE4APDE4BPDE4CPDE4DABCG2
SCHEMBL25200295 0.83 MAPT (0.72) LMNAALDH1A1HPGDMEN1KMT2A
SCHEMBL25235120 0.83 MAPT (0.72) LMNAALDH1A1HPGDMEN1KMT2A
SCHEMBL8848307 0.83 DBH (0.78) LMNAALDH1A1HPGDPDE4APDE4B
SCHEMBL8848314 0.83 DBH (0.78) LMNAALDH1A1HPGDPDE4APDE4B
SCHEMBL2458577 0.82 ABCG2 (1.00) LMNAPDE4APDE4BPDE4CPDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed