Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.46 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | IDO1 | P14902 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29167883 | 0.83 | SLC6A3 (0.44) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL14578298 | 0.83 | SLC6A3 (0.43) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL5402280 | 0.83 | SLC6A3 (0.43) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL10455907 | 0.83 | SLC6A3 (0.43) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL11719808 | 0.81 | SLC6A3 (0.46) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL10455908 | 0.81 | SLC6A3 (0.46) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL13686149 | 0.81 | SLC6A3 (0.46) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL10391386 | 0.80 | SLC6A3 (0.49) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL14233518 | 0.80 | SLC6A3 (0.43) | SLC6A3HPGDGAAMEN1KMT2A | |
| SCHEMBL5570712 | 0.80 | SLC6A3 (0.43) | SLC6A3HPGDGAAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0524246-B1 | RESIST MATERIAL AND PROCESS FOR USE | DU PONT (US) | 1996-05-08 | — | — | EP | disclosed |
| US-5219711-A | Positive image formation utilizing resist material with carbazole diazonium salt acid generator | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-06-15 | — | — | US | disclosed |
| US-5212047-A | Resist material and process for use | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-05-18 | — | — | US | disclosed |
| US-5206317-A | RESIST MATERIAL AND PROCESS FOR USE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-04-27 | — | — | US | disclosed |
| EP-0524246-A1 | RESIST MATERIAL AND PROCESS FOR USE. | DU PONT (US) | 1993-01-27 | — | — | EP | disclosed |
| WO-1991015807-A1 | RESIST MATERIAL WITH CARBAZOLE DIAZONIUM SALT ACID GENERATOR AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| WO-1991015810-A1 | RESIST MATERIAL AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| US-4985332-A | Resist material with carbazole diazonium salt acid generator and process for use | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-15 | — | — | US | disclosed |