SCHEMBL8980806

SCHEMBL8980806

CN1C(=O)c2ccc(-c3cccs3)cc2C1=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC6A11 P48066 1/20 0.54
▸ PGR P06401 2/20 0.46
▸ KCNH2 Q12809 1/20 0.45
▸ ALDH1A1 P00352 3/20 0.44
▸ APP P05067 2/20 0.43
▸ CHEK1 O14757 2/20 0.42
▸ ERN1 O75460 1/20 0.42
▸ MEN1 O00255 2/20 0.41
▸ MAPT P10636 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.41
▸ ALOX15 P16050 1/20 0.41
▸ NR4A2 P43354 1/20 0.41
▸ BTK Q06187 1/20 0.41
▸ CASP3 P42574 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ MAPK1 P28482 1/20 0.41
▸ HDAC3 O15379 1/20 0.40
▸ HDAC1 Q13547 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13058811 0.81 SLC6A11 (0.44) SLC6A11PGRKCNH2CHEK1ERN1
SCHEMBL10053401 0.78 ALDH1A1 (0.59) ALDH1A1APPMEN1MAPTKMT2A
SCHEMBL25165799 0.78 ALDH1A1 (0.47) ALDH1A1APPMEN1MAPTKMT2A
SCHEMBL25165762 0.78 ALDH1A1 (0.47) ALDH1A1APPMEN1MAPTKMT2A
SCHEMBL30512416 0.78 SLC6A11 (0.61) SLC6A11PGRKCNH2CHEK1ERN1
SCHEMBL21580251 0.78 SLC6A11 (0.61) SLC6A11PGRKCNH2CHEK1ERN1
SCHEMBL12019932 0.76 MAOB (0.41) PGRALDH1A1ERN1MEN1MAPT
SCHEMBL15571223 0.76 PRF1 (0.48) SLC6A11PGRKCNH2ERN1NR4A2
SCHEMBL15571925 0.76 PRF1 (0.53) —
SCHEMBL15571900 0.75 PRF1 (0.49) SLC6A11PGRKCNH2ALDH1A1CHEK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5494944-A BLEND OF MATERIAL POLYMERIZABLE BY FREE RADICAL CATALYSTAND AN IRON COMPOUND CIBA-GEIGY CORPORATION (US) 1996-02-27 — — US disclosed
US-5371115-A Having sensitizers, electron acceptors selected from peracids, hydroperoxides and quinones; photosensitive, photoresists CIBA-GEIGY CORPORATION (US) 1994-12-06 — — US disclosed
EP-0295211-B1 Photoresist composition CIBA GEIGY AG (CH) 1994-03-16 — — EP disclosed
US-5124233-A PHOTORESIST COMPOSITIONS CIBA-GEIGY CORPORATION (US) 1992-06-23 — — US disclosed
EP-0214103-B1 ADHESIVELY BONDED PHOTOSTRUCTURABLE POLYIMIDE FOIL CIBA-GEIGY AG (CH) 1990-06-27 — — EP disclosed
US-4935320-A Substrate, thermostable adhesive, self-supporting, photocrosslinkable polyimide film CIBA-GEIGY CORPORATION (US) 1990-06-19 — — US disclosed
EP-0295211-A2 Photoresist composition CIBA-GEIGY AG (CH) 1988-12-14 — — EP disclosed
US-4786569-A Adhesively bonded photostructurable polyimide film CIBA-GEIGY CORPORATION (US) 1988-11-22 — — US disclosed
EP-0153904-B1 PROCESS FOR THE PREPARATION OF A PROTECTION LAYER OR A RELIEF PATTERN CIBA-GEIGY AG (CH) 1988-09-14 — — EP disclosed
EP-0152377-B1 CURABLE COMPOSITIONS AND THEIR USE CIBA-GEIGY AG (CH) 1987-12-09 — — EP disclosed
EP-0214103-A2 Adhesively bonded photostructurable polyimide foil CIBA-GEIGY AG (CH) 1987-03-11 — — EP disclosed
US-4624912-A EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING CIBA-GEIGY CORPORATION (US) 1986-11-25 — — US disclosed
EP-0153904-A2 Process for the preparation of a protection layer or a relief pattern CIBA-GEIGY AG (CH) 1985-09-04 — — EP disclosed
EP-0152377-A2 Curable compositions and their use CIBA-GEIGY AG (CH) 1985-08-21 — — EP disclosed
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