SCHEMBL8990168

SCHEMBL8990168

CCOc1cc(C)cc(-c2cc(C)cc(OCC)c2O)c1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 4/20 0.39
▸ ALDH1A1 P00352 4/20 0.39
▸ MAPT P10636 4/20 0.39
▸ KMT2A Q03164 4/20 0.39
▸ POLB P06746 2/20 0.39
▸ GAA P10253 1/20 0.39
▸ APEX1 P27695 1/20 0.39
▸ MPI P34949 1/20 0.39
▸ RECQL P46063 1/20 0.39
▸ HSD17B10 Q99714 2/20 0.39
▸ HPGD P15428 1/20 0.39
▸ ALOX15 P16050 1/20 0.39
▸ BACE1 P56817 1/20 0.39
▸ TSHR P16473 2/20 0.37
▸ CYP3A4 P08684 1/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ MEN1 O00255 3/20 0.37
▸ ALPL P05186 1/20 0.37
▸ ALPI P09923 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10972323 0.89 ALDH1A1 (0.43) KDM4EALDH1A1MAPTKMT2APOLB
SCHEMBL20414730 0.85 ALDH1A1 (0.55) KDM4EALDH1A1MAPTKMT2APOLB
SCHEMBL19732196 0.84 HSD17B10 (0.48) KDM4EALDH1A1MAPTKMT2APOLB
SCHEMBL29200157 0.83 KDM4E (0.49) KDM4EALDH1A1MAPTKMT2APOLB
SCHEMBL29200150 0.82 ERN1 (0.50) KDM4EMAPTKMT2APOLBGAA
SCHEMBL19732197 0.80 BACE1 (0.44) KDM4EALDH1A1MAPTKMT2APOLB
SCHEMBL19732199 0.80 KMT2A (0.49) KDM4EALDH1A1MAPTKMT2APOLB
SCHEMBL28827562 0.79 KDM4E (0.43) KDM4EALDH1A1MAPTKMT2ATSHR
SCHEMBL29763160 0.79 KDM4E (0.43) KDM4EALDH1A1MAPTKMT2ATSHR
SCHEMBL7520392 0.76 ERN1 (0.57) KDM4EALDH1A1MAPTKMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 — — EP claimed
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 — — EP disclosed
US-5262295-A Biphenyldihydroxide reducing agent for silver halide emulsion layers CANON KABUSHIKI KAISHA (JP) 1993-11-16 — — US disclosed
EP-0509740-A1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KABUSHIKI KAISHA (JP) 1992-10-21 — — EP disclosed
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