⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL546443 | 0.87 | KCNH2 (0.32) | — | |
| SCHEMBL491941 | 0.81 | — | — | |
| SCHEMBL15092951 | 0.81 | — | — | |
| SCHEMBL6826930 | 0.81 | KCNH2 (0.34) | — | |
| SCHEMBL6826962 | 0.79 | KCNH2 (0.33) | — | |
| SCHEMBL9500775 | 0.75 | — | — | |
| SCHEMBL16544484 | 0.75 | — | — | |
| SCHEMBL1866814 | 0.75 | HDAC3 (0.31) | — | |
| SCHEMBL14852890 | 0.74 | LTA4H (0.34) | — | |
| SCHEMBL9152007 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0427950-B1 | A photosensitive resin composition for use in forming a relief structure | ASAHI CHEMICAL IND (JP) | 1996-07-17 | — | — | EP | disclosed |
| US-5336585-A | Free of tunnel voids | ASAHI KASEI KOGYO KABUSHIKI (JP) | 1994-08-09 | — | — | US | disclosed |
| EP-0427950-A2 | A photosensitive resin composition for use in forming a relief structure | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1991-05-22 | — | — | EP | disclosed |