SCHEMBL8994871

SCHEMBL8994871

c1ccc(OCc2ccc3ccccc3c2)cc1

nearest known ligand 0.68

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 1/20 0.67
ALOX5 P09917 4/20 0.66
MAOB P27338 2/20 0.58
APP P05067 1/20 0.57
MRGPRX4 Q96LA9 1/20 0.53
TLR4 O00206 1/20 0.52
TLR2 O60603 1/20 0.52
PLA2G4B P0C869 1/20 0.52
CYP1A2 P05177 1/20 0.52
CYP2A6 P11509 1/20 0.52
F2 P00734 2/20 0.51
CNR1 P21554 1/20 0.51
CNR2 P34972 1/20 0.51
CYSLTR2 Q9NS75 1/20 0.50
CYSLTR1 Q9Y271 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10400372 0.94 RAB9A (0.74) RAB9AALOX5MAOBMRGPRX4PLA2G4B
SCHEMBL12938497 0.88 ALOX5 (0.78) RAB9AALOX5MAOBMRGPRX4TLR4
SCHEMBL10896488 0.86 RAB9A (0.66) RAB9AALOX5MAOBAPPMRGPRX4
SCHEMBL14191435 0.85 RAB9A (0.64) RAB9AALOX5MAOBMRGPRX4PLA2G4B
SCHEMBL9227262 0.85 RAB9A (0.64) RAB9AALOX5MAOBAPPMRGPRX4
SCHEMBL31307780 0.85 RAB9A (0.64) RAB9AALOX5MAOBMRGPRX4PLA2G4B
SCHEMBL8081412 0.85 RAB9A (0.64) RAB9AALOX5MAOBMRGPRX4TLR4
SCHEMBL13463058 0.85 CYP1A2 (0.66) RAB9AALOX5MAOBMRGPRX4PLA2G4B
SCHEMBL31307773 0.85 RAB9A (0.64) RAB9AALOX5MAOBMRGPRX4TLR4
SCHEMBL13904132 0.85 APP (0.66) RAB9AALOX5APP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5530128-A ENZYME INHIBITOR AS ANTITUMOR AGENT CELLTECH THERAPEUTICS LIMITED (GB) 1996-06-25 US claimed
US-9904168-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed
US-20160320700-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-11-03 US disclosed